scholarly journals Atomistic Simulation Study of Short Pulse Laser-Induced Generation of Crystal Defects in Metal Targets

2015 ◽  
Author(s):  
Eaman Abdul Karim
2014 ◽  
Vol 115 (18) ◽  
pp. 183501 ◽  
Author(s):  
Eaman T. Karim ◽  
Maxim Shugaev ◽  
Chengping Wu ◽  
Zhibin Lin ◽  
Robert F. Hainsey ◽  
...  

2001 ◽  
Author(s):  
Jiri Limpouch ◽  
A. B. Iskakov ◽  
Aleksandr A. Andreev ◽  
Hidetoshi Nakano

Author(s):  
F. Beaudoin ◽  
P. Perdu ◽  
C. DeNardi ◽  
R. Desplats ◽  
J. Lopez ◽  
...  

Abstract Ultra-short pulse laser ablation is applied to IC backside sample preparation. It is contact-less, non-thermal, precise and can ablate the various types of material present in IC packages. This study concerns the optimization of ultra-short pulse laser ablation for silicon thinning. Uncontrolled silicon roughness and poor uniformity of the laser thinned cavity needed to be tackled. Special care is taken to minimize the silicon RMS roughness to less than 1µm. Application to sample preparation of 256Mbit devices is presented.


2013 ◽  
Vol 115 (4) ◽  
pp. 1469-1477 ◽  
Author(s):  
Evgeny Kharanzhevskiy ◽  
Sergey Reshetnikov

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