scholarly journals Spectroscopic Analysis of Argon and Zinc Emission Lines in Argon-Nitrogen Mixed Gas Inductively Coupled Plasma.

1993 ◽  
Vol 9 (4) ◽  
pp. 509-516 ◽  
Author(s):  
Kazuaki WAGATSUMA ◽  
Kichinosuke HIROKAWA
Keyword(s):  
Inductively Coupled Plasma ◽  
Spectroscopic Analysis ◽  
Emission Lines ◽  
Mixed Gas ◽  
Inductively Coupled

Jet Shape Analysis and Removal Function Optimization of Atmospheric Plasma Processing Applied in Optical Fabrication

2021 ◽  
Author(s):  
Yuan Jin ◽  
Bo Wang ◽  
Peng Ji ◽  
Zheng Qiao ◽  
Duo LI ◽  
...  
Keyword(s):  
Inductively Coupled Plasma ◽  
Rotational Symmetry ◽  
Mechanical Damage ◽  
Plasma Jet ◽  
Function Optimization ◽  
Atmospheric Plasma ◽  
Optical Fabrication ◽  
Mixed Gas ◽  
Pinch Effect ◽  
Inductively Coupled

Abstract When using Inductively Coupled Plasma (ICP) as a machining tool, its processing method based on the principle of chemical etching leads to no contact stress between the tool and the material, thereby generating no mechanical damage. In recent years, this issue has been widely concerned in the field of optical fabrication. However, there are many differences between low power ICP jet and conventional ICP jet, one of which is that the former does not easily form a rotation-symmetric removal function due to its obvious pinch effect. In this research, the electromagnetism principle of the plasma pinch effect was analyzed firstly, and the jet shape under the pinch effect was classified. Then, experimental study was carried out on the plasma jet shape under the pure Ar and mixed gas of CF4-Ar, and the influence law of the reaction gas on the jet propagation shape was analyzed. Finally, the rotational symmetry of the removal function of plasma jet processing was optimized, and the nozzle design criteria based on pinch effect were proposed.

Fourier Deconvolution of Overlapping Line Pairs in Inductively Coupled Plasma-Atomic Emission Spectrometry

1989 ◽  
Vol 43 (1) ◽  
pp. 96-103 ◽  
Author(s):  
Eric H. Van Veen ◽  
M. Pieter Goudzwaard ◽  
Margaretha T. C. De Loos-Vollebregt ◽  
Leo De Galan
Keyword(s):  
Inductively Coupled Plasma ◽  
Gaussian Approximation ◽  
Signal To Noise Ratio ◽  
Detection Limits ◽  
Atomic Emission ◽  
Emission Lines ◽  
Emission Spectrometry ◽  
Plasma Atomic Emission Spectrometry ◽  
Spectral Window ◽  
Inductively Coupled

A deconvolution procedure utilizing Fourier transformation has been developed to reduce line overlap in ICP-AES. Line broadening is caused by physical processes and by instrumental broadening. Convenient deconvolution, however, turns out to be restricted to broadening common to the emission lines in the spectral window, i.e., to instrumental broadening. Deconvolution for the “true” instrumental broadening function and for a Gaussian approximation to this function yields similar results, but the former allows for fast automated data processing with regard to any spectral region and sample composition. A straightforward procedure is reported for the determination of this function independent of wavelength. At the present noise level, a twofold reduction in linewidth can be achieved for emission lines having a small physical width in comparison to the instrumental width. With data acquired from both a high- and a medium-resolution monochromator, results from overlapping line pairs show linear analytical curves and improved detection limits. Due to the decrease in signal-to-noise ratio on deconvolution, the detection limits measured for isolated lines cannot be attained.

Improving the analytical performance of electrothermal vaporization coupled to inductively coupled plasma optical emission spectrometry using a mixed-gas plasma

2019 ◽  
Vol 34 (5) ◽  
pp. 891-898 ◽  
Author(s):  
Guilherme Luiz Scheffler ◽  
Dirce Pozebon ◽  
Diane Beauchemin
Keyword(s):  
Inductively Coupled Plasma ◽  
Limit Of Detection ◽  
Optical Emission ◽  
Emission Spectrometry ◽  
Solid Sampling ◽  
Electrothermal Vaporization ◽  
Mixed Gas ◽  
Inductively Coupled ◽  
Gas Plasma ◽  
Plasma Optical Emission Spectrometry

Adding nitrogen to the plasma gas in ICPOES significantly improves sensitivity and limit of detection for solid sampling ETV.

Application of Thyristor AC Voltage Regulation Technology in ICP Spectrum Excitation Source

2011 ◽  
Vol 383-390 ◽  
pp. 6010-6013
Author(s):  
Ying Chang Zhou ◽  
Rui Jun Jia ◽  
Rong Xia Sun ◽  
Pan Pan Huang ◽  
Yong Qing Wang
Keyword(s):  
Standard Deviation ◽  
Inductively Coupled Plasma ◽  
Spectroscopic Analysis ◽  
Voltage Regulation ◽  
Excitation Source ◽  
Control Technology ◽  
Inductively Coupled ◽  
Relative Standard ◽  
Spectrum Excitation ◽  
Plasma Excitation

SCM control technology be applied to inductively coupled plasma excitation source in this paper. Through controlling thyristor trigger angle control AC voltage regulation, the go through step-up circuit to achieve output power continuously adjustable. It introduces construction and work principle. Grating spectrograph is co-operated with thyristor AC voltage ICP excitation source for performance tested. By means of Ar355.431nm tested power stability≤0.5%. Testing Fe, Cu, Au and other elements shows that the detection limit is 10-9g/ml, precision relative standard deviation RSD≤ 3％. Results show that this voltage regulation technology is stable, reduces the instrument’s size and operates conveniently. It is suitable for ICP excitation source in spectroscopic analysis.

Advantages, drawbacks and applications of mixed Ar–N2 sources in inductively coupled plasma-based techniques: an overview

2014 ◽  
Vol 6 (16) ◽  
pp. 6170-6182 ◽  
Author(s):  
G. L. Scheffler ◽  
D. Pozebon
Keyword(s):  
Mass Spectrometry ◽  
Inductively Coupled Plasma ◽  
Optical Emission ◽  
Emission Spectrometry ◽  
Icp Oes ◽  
Mixed Gas ◽  
Inductively Coupled ◽  
Icp Ms ◽  
Plasma Mass Spectrometry ◽  
Plasma Optical Emission Spectrometry

This review deals with mixed gas Ar–N2 plasmas, highlighting advantages, limitations and applications of them in inductively coupled plasma optical emission spectrometry (ICP OES), inductively coupled plasma mass spectrometry (ICP-MS) and laser ablation inductively coupled plasma mass spectrometry (LA-ICP-MS) techniques, covering publications in the last three decades.

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