scholarly journals Fabrication of Tantalum Oxyfluoride and Oxynitride Thin Films via Ammonolysis of Sol-Gel Processed Tetraethoxo (β-diketonato) Tantalum (V) Precursors for Enhanced Photocatalytic Activity

Author(s):  
Mohammad Danish ◽  
Ashutosh Pandey ◽  
Aftab Aslam Parwaz Khan ◽  
Abdullah M Asiri

Abstract In the present report, the generation of Tantalum oxyfluoride and oxynitride upon ammonolysis of the gel obtained from modified tantalum-alkoxo complexes is reported. To the best of our knowledge, this is first report of the formation of tantalum oxyfluoride thin films via ammonolysis of the β-diketone modified tantalum-alkoxo complex [Ta(OEt)4(CF3COCH2COCH3)]m. The integration of nitrogen and fluorine in lattice sites of metal oxides leads to significant reduction in the band gap, resulting in their activation under visible light. Moreover, in this report the effect of the modified alkoxide precursors and ammonolysis on the photo-physical properties of Ta2O5 thin films have also been investigated and compared with the results obtained from films fabricated from unmodified tantalum (V) ethoxide. 1H NMR, 13C NMR and elemental analyses confirmed successful modification of tantalum (V) ethoxide to [Ta(OCH2CH3)4(CH3COCHClCOCH3)]m (1), [Ta(OCH2CH3)4(CF3COCH2COCH3]m (2) and [Ta(OCH2CH3)4 (CH3COC(CH3)2COCH3))]m (3). The fabrication of Ta2O5 thin films involved the spin casting of the gels of modified tantalum alkoxo complexes (processed by sol-gel method) on to glass substrate. X-ray photoelectron spectroscopy results show that nitrogen was incorporated into the ammonolyzed films fabricated from complex precursors (1) and (3), while the presence of fluorine as tantalum oxyfluoride was confirmed in the ammonolyzed film fabricated from complex (2) precursor. The optical characterization insinuate band gap narrowing from 3.55 eV for undoped film prepared from tantalum (V) ethoxide to 3.47 eV for undoped film prepared from [Ta(OEt)4(CF3COCH2COCH3)]m and 3.05 eV for ammonolyzed film obtained from [Ta(OEt)4(CF3COCH2COCH3)]m precursor. Furthermore, enhanced photocatalytic efficiency of the films is demonstrated by degradation of methylene blue dye.

2012 ◽  
Vol 2 (1) ◽  
Author(s):  
Marek Nocuń ◽  
Sławomir Kwaśny

AbstractIn our investigation, V doped SiO2/TiO2 thin films were prepared on glass substrates by dip coating sol-gel technique. Chemical composition of the samples was studied by X-ray photoelectron spectroscopy (XPS). Transmittance of the samples was characterized using UV-VIS spectrophotometry. Subsequently band-gap energy (Eg) was estimated for these films. Powders obtained from sols were characterized by FTIR spectroscopy. It was found that vanadium decreases optical band gap of SSiO2/TiO2 films.


2019 ◽  
Vol 234 (10) ◽  
pp. 647-655
Author(s):  
Zohra Nazir Kayani ◽  
Atiqa Aslam ◽  
Rabia Ishaque ◽  
Syeda Nosheen Zahra ◽  
Hifza Hanif ◽  
...  

Abstract Nickel oxide thin films have been prepared by sol-gel dip-coating technique on glass substrate. It is shown that nickel oxide thin films have poly crystalline nature. Nickel oxide thin films exhibit high transmission (39–85%) in the wavelength range of 400–900 nm, strong absorption between 300 and 400 nm wavelengths and decrease of band gap values are in the range 3.69–3.27 eV with increase of withdrawal speed. High band gap at low withdrawal speed is because of the small average crystallite size, which decreases with increase in withdrawal speed. The SEM micrograph shows cubic crystallites and surface of thin films become dense, smooth and homogeneous with an increase in withdrawal speed. Assessment of nickel oxide deposition conditions provides gateway for effective and cheap solar cells.


2017 ◽  
Vol 162 ◽  
pp. 01042
Author(s):  
Yen Chin Teh ◽  
Ala’eddin A. Saif ◽  
Zul Azhar Zahid Jamal ◽  
Prabakaran Poopalan

1984 ◽  
Vol 32 ◽  
Author(s):  
Carlo G. Pantano ◽  
C. A. Houser ◽  
R. K. Brow

ABSTRACTThe application of surface analysis techniques to the characterization of sol/gel surfaces and thin films is described. Secondary-ion mass spectroscopy (SIMS), x-ray photoelectron spectroscopy (XPS) and sputter-induced photon spectroscopy (SIPS) are used to measure the composition of multicomponent silicate films, the relative water content of alumina films, the nitrogen content of ammonia treated silica films, and the depth profiles for films on black chrome. The determination of chemical structure using XPS and SIMS is also discussed. Finally, a brief introduction to temperature-programmed desorption (TPD) and its potential for studying surface chemical reactions, in situ, is presented.


2014 ◽  
Vol 11 (9-10) ◽  
pp. 1488-1492 ◽  
Author(s):  
Amanpal Singh ◽  
Sonia Saini ◽  
Dinesh Kumar ◽  
P. K. Khanna ◽  
Mukesh Kumar ◽  
...  
Keyword(s):  
Band Gap ◽  

2011 ◽  
Vol 520 (3) ◽  
pp. 1147-1154 ◽  
Author(s):  
Mohamed N. Ghazzal ◽  
N. Chaoui ◽  
M. Genet ◽  
Eric M. Gaigneaux ◽  
D. Robert

2009 ◽  
Vol 79-82 ◽  
pp. 747-750 ◽  
Author(s):  
Dong Qing Liu ◽  
Wen Wei Zheng ◽  
Hai Feng Cheng ◽  
Hai Tao Liu

Thermochromic vanadium dioxide (VO2) exhibits a semi-conducting to metallic phase transition at about 68°C, involving strong variations in electrical and optical properties. A simple method was proposed to prepare VO2 thin films from easily gained V2O5 thin films. The detailed thermodynamic calculation was done and the results show that V2O5 will decompose to VO2 when the post annealing temperature reaches 550°C at the atmospheric pressure of less than 0.06Pa. The initial V2O5 films were prepared by sol-gel method on fused-quartz substrates. Different post annealing conditions were studied. The derived VO2 thin film samples were characterized using X-ray diffraction and X-ray photoelectron spectroscopy. The electrical resistance and infrared emissivity of VO2 thin films under different temperatures were measured. The results show that the VO2 thin film derived from the V2O5 thin film annealed at 550°C for 10 hours is pure dioxide of vanadium without other valences. It was observed that the resistance of VO2 thin film with thickness about 600nm can change by 4 orders of magnitude and the 7.5-14μm emissivity can change by 0.6 during the phase transition.


2008 ◽  
Vol 2008 ◽  
pp. 1-5 ◽  
Author(s):  
E. Barrera-Calva ◽  
J. Méndez-Vivar ◽  
M. Ortega-López ◽  
L. Huerta-Arcos ◽  
J. Morales-Corona ◽  
...  

Silica-copper oxide (silica-CuO) composite thin films were prepared by a dipping sol-gel route using ethanolic solutions comprised TEOS and a copper-propionate complex. Sols with different TEOS/Cu-propionate (Si/Cu) molar ratios were prepared and applied on stainless steel substrates using dipping process. During the annealing process, copper-propionate complexes developed into particulate polycrystalline CuO dispersed in a partially crystallized silica matrix, as indicated by the X-ray diffraction (XRD) and X-ray photoelectron spectroscopy (XPS) analyses. The gel thermal analysis revealed that the prepared material might be stable up to400°C. The silica-CuO/stainless steel system was characterized as a selective absorber surface and its solar selectivity parameters, absorptance (α), and emittance (ε) were evaluated from UV-NIR reflectance data. The solar parameters of such a system were mostly affected by the thickness and phase composition of theSiO2-CuO film. Interestingly, the best solar parameters (α= 0.92 andε= 0.2) were associated to the thinnest films, which comprised a CuO-Cu2Omixture immersed in the silica matrix, as indicated by XPS.


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