Monte Carlo Studies of Hot-Electron Distributions in Thin Insulating Films. 2. Energy Dependent Mean Free Path and Instability

1976 ◽  
Author(s):  
S. Baidyaroy ◽  
M. A. Lampert ◽  
B. Zee ◽  
Ramon U. Martinelli
1986 ◽  
Vol 25 (Part 1, No. 3) ◽  
pp. 402-405 ◽  
Author(s):  
Takeshi Kobayashi ◽  
Hiroyuki Sakai ◽  
Yoshiyuki Kurita ◽  
Masayoshi Tonouchi ◽  
Michihiro Okada

VLSI Design ◽  
1998 ◽  
Vol 8 (1-4) ◽  
pp. 343-347 ◽  
Author(s):  
Jürgen Jakumeit ◽  
Amanda Duncan ◽  
Umberto Ravaioli ◽  
Karl Hess

The Mutation Operator Monte Carlo method (MOMC) is a new type of Monte Carlo technique for the study of hot electron related effects in semiconductor devices. The MOMC calculates energy distributions of electrons by a physical mutation of the distribution towards a stationary condition. In this work we compare results of an one dimensional simulation of an 800nm Si-MOSFET with full band Monte Carlo calculations and measurement results. Starting from the potential distribution resulting from a drift diffusion simulation, the MOMC calculates electron distributions which are comparable to FBMC-results within minutes on a modern workstation. From these distributions, substrate and gate currents close to experimental results can be calculated. These results show that the MOMC is useful as a post-processor for the investigation of hot electron related problems in Si-MOSFETs. Beside the computational efficiency, a further advantage of the MOMC compared to standard MC techniques is the good resolution of the high energy tail of the distribution without the necessity of any statistical enhancement.


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