scholarly journals Optical simulations of the ion beam emittance growth in different types of a gridded lens

2007 ◽  
Author(s):  
Pikin A.
Keyword(s):  
Ion Beam ◽  
Beam Emittance ◽  
Emittance Growth ◽  
Different Types

scholarly journals Heavy-ion beam focusing with a wall-stabilized plasma lens

1995 ◽  
Vol 13 (2) ◽  
pp. 221-229 ◽  
Author(s):  
A. Tauschwitz ◽  
E. Boggasch ◽  
D.H.H. Hoffmann ◽  
J. Jacoby ◽  
U. Neuner ◽  
...  
Keyword(s):  
Inertial Confinement Fusion ◽  
Focal Spot ◽  
Ion Beam ◽  
Heavy Ion ◽  
Spot Size ◽  
High Energy ◽  
Experimental Program ◽  
Focal Spot Size ◽  
Beam Emittance ◽  
Beam Focusing

Focusing of heavy-ion beams is an important issue for ion beam-driven inertial confinement fusion. For the experimental program to investigate matter at high energy densities at GSI, the application of a plasma lens has attractive features compared to standard quadrupole lenses. A plasma lens using a wall-stabilized discharge has been systematically investigated and optimized for this purpose. Different lenses were tested in several runs at the GSI linear accelerator UNILAC and at the SIS-synchrotron. A remarkably high accuracy and reproducibility of the focusing were found. The focal spot size was mainly limited by the beam emittance. A summary of experimental results and important limitations of the focal spot size is given.

Focused Ion-Beam (FIB) Nanomachining of Silicon Carbide (SiC) Stencil Masks for Nanoscale Patterning

2012 ◽  
Vol 717-720 ◽  
pp. 889-892 ◽  
Author(s):  
Hamidreza Zamani ◽  
Seung Wan Lee ◽  
Amir Avishai ◽  
Christian A. Zorman ◽  
R. Mohan Sankaran ◽  
...  
Keyword(s):  
Thin Films ◽  
Silicon Carbide ◽  
Focused Ion Beam ◽  
Ion Beam ◽  
High Quality ◽  
Nanoscale Patterning ◽  
Different Types ◽  
Thin Membranes ◽  
Amorphous Sic ◽  
Nanoscale Features

We report on experimental explorations of using focused ion beam (FIB) nanomachining of different types of silicon carbide (SiC) thin membranes, for making robust, high-quality stencil masks for new emerging options of nanoscale patterning. Using thin films and membranes in polycrystalline SiC (poly-SiC), 3C-SiC, and amorphous SiC (a-SiC) with thicknesses in the range of t~250nm−1.6μm, we have prototyped a series of stencil masks, with nanoscale features routinely down to ~100nm.

Beam emittance measurements of transformer coupled plasma ion source for focused ion beam

2004 ◽  
Vol 75 (5) ◽  
pp. 1681-1683 ◽  
Author(s):  
Yoon Jae Kim ◽  
I. S. Hong ◽  
H. S. Kim ◽  
Y. S. Hwang
Keyword(s):  
Focused Ion Beam ◽  
Ion Beam ◽  
Ion Source ◽  
Beam Emittance ◽  
Plasma Ion Source
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