scholarly journals Свободная энергия образования зародыша при росте III-V нитевидного нанокристалла

Author(s):  
В.Г. Дубровский ◽  
А.С. Соколовский ◽  
И.В. Штром

An expression for the free energy of forming an island from a catalyst droplet in the vapor-liquid-solid growth of III-V nanowires is obtained. The effect of the droplet depletion with its group V (As) content is studied in the presence of material influx from vapor. Different growth regimes of a nanowire monolayer are theoretically analyzed, including the regime with the stopping size under very low As concentrations in liquid. It is shown that the island stops growing when the As content in the droplet decreases to its equilibrium value. The obtained results should be useful for understanding and modeling the growth kinetics of III-V nanowires, their crystal phase, nucleation statistics and length distributions within the ensembles of nanowires as well as the doping process.

Nano Letters ◽  
2013 ◽  
Vol 13 (9) ◽  
pp. 4044-4052 ◽  
Author(s):  
Subhajit Biswas ◽  
Colm O’Regan ◽  
Nikolay Petkov ◽  
Michael A. Morris ◽  
Justin D. Holmes

2008 ◽  
Vol 8 (3) ◽  
pp. 1051-1054 ◽  
Author(s):  
Maher Soueidan ◽  
Gabriel Ferro ◽  
Olivier Kim-Hak ◽  
Nada Habka ◽  
Véronique Soulière ◽  
...  

Nanomaterials ◽  
2021 ◽  
Vol 11 (1) ◽  
pp. 83
Author(s):  
Hadi Hijazi ◽  
Mohammed Zeghouane ◽  
Vladimir G. Dubrovskii

Based on a thermodynamic model, we quantify the impact of adding silicon atoms to a catalyst droplet on the nucleation and growth of ternary III–V nanowires grown via the self-catalyzed vapor–liquid–solid process. Three technologically relevant ternaries are studied: InGaAs, AlGaAs and InGaN. For As-based alloys, it is shown that adding silicon atoms to the droplet increases the nanowire nucleation probability, which can increase by several orders magnitude depending on the initial chemical composition of the catalyst. Conversely, silicon atoms are found to suppress the nucleation rate of InGaN nanowires of different compositions. These results can be useful for understanding and controlling the vapor–liquid–solid growth of ternary III–V nanowires on silicon substrates as well as their intentional doping with Si.


Nanoscale ◽  
2014 ◽  
Vol 6 (12) ◽  
pp. 7033 ◽  
Author(s):  
Gang Meng ◽  
Takeshi Yanagida ◽  
Hideto Yoshida ◽  
Kazuki Nagashima ◽  
Masaki Kanai ◽  
...  

Author(s):  
В.Г. Дубровский ◽  
А.С. Соколовский ◽  
H. Hijazi

Theoretical analysis is presented for vapor-liquid-solid growth of III-V nanowires in the presence of three competing processes of the group V deposition, surface diffusion of group III adatoms and nucleation of islands at the liquid-solid interface. A generalized equation for the nanowire growth rate is obtained which can be limited of one of the three processes depending on the growth environment. Different regimes of vapor-liquid-solid growth of III-V nanowires are analyzed depending on the group III and V influxes and nanowire radius.


Science ◽  
2008 ◽  
Vol 322 (5904) ◽  
pp. 1070-1073 ◽  
Author(s):  
B. J. Kim ◽  
J. Tersoff ◽  
S. Kodambaka ◽  
M. C. Reuter ◽  
E. A. Stach ◽  
...  

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