Multiaxis interferometric displacement measurement for local probe microscopy
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AbstractWe present an overview of design approaches for nanometrology measuring setups with a focus on interferometry techniques and associated problems. The design and development of a positioning system with interferometric multiaxis monitoring and control is presented. The system is intended to operate as a national nanometrology standard combining local probe microscopy techniques and sample position control with traceability to the primary standard of length.
2021 ◽
Vol 1055
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pp. 012158
2016 ◽
Vol 12
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pp. 673-678
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1996 ◽
Vol 118
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pp. 514-521
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2021 ◽
Vol 5
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pp. 20-38
2018 ◽
Vol 10
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pp. 36-46
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2013 ◽
Vol 347-350
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pp. 2942-2946