Statistical Gate-Delay Modeling with Copulas

2020 ◽  
Vol 15 (3) ◽  
pp. 1-10
Author(s):  
Walter Schneider

The growing impact of process variations on circuit performance has become a major concern for deep-submicron integrated circuit design, resulting in numerous SSTA-algorithms. The acceptance of such algorithms in industry however will be dependent on modeling the real silicon behavior in SSTA. This includes that the statistical gate-delay models must consider arbitrary process variations and dependencies. In this paper, we introduce the innovative concept of Copulas to handle this topic. A complete Matlab based framework starting from process parameter statistics up to the computation of the statistical gate-delay distribution is presented. Experimental results demonstrate the importance of accounting realistic process variations.

Author(s):  
Hung-Sung Lin ◽  
Ying-Chin Hou ◽  
Juimei Fu ◽  
Mong-Sheng Wu ◽  
Vincent Huang ◽  
...  

Abstract The difficulties in identifying the precise defect location and real leakage path is increasing as the integrated circuit design and process have become more and more complicated in nano scale technology node. Most of the defects causing chip leakage are detectable with only one of the FA (Failure Analysis) tools such as LCD (Liquid Crystal Detection) or PEM (Photon Emission Microscope). However, due to marginality of process-design interaction some defects are often not detectable with only one FA tool [1][2]. This paper present an example of an abnormal power consumption process-design interaction related defect which could only be detected with more advanced FA tools.


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