Dependence of Ar+ and Ti+ Ion Energy Distributions on Ar Pressure in Inductively Coupled rf Plasma Enhanced Magnetron Sputtering.
1999 ◽
Vol 42
(3)
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pp. 413-416
Suguru SAIKI
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Takayoshi SAITO
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Toshiki KOBAYASHI
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Kazuhiro FUKUSHIMA
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Naoto KIKUCHI
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...
2006 ◽
Vol 515
(4)
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pp. 1522-1526
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J. Bohlmark
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M. Lattemann
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J.T. Gudmundsson
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A.P. Ehiasarian
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Y. Aranda Gonzalvo
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...
2000 ◽
Vol 88
(8)
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pp. 4510
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Martin Misakian
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Eric Benck
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Yicheng Wang
1999 ◽
Vol 85
(9)
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pp. 6358-6365
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Yicheng Wang
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J. K. Olthoff
2012 ◽
Vol 21
(6)
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pp. 065009
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Michael D Logue
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Hyungjoo Shin
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Weiye Zhu
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Lin Xu
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Vincent M Donnelly
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...
1998 ◽
Vol 41
(3)
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pp. 147-150
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Masamichi MATSUURA
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Tadashi YAMAMOTO
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Tadashi MORITA
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Toshiharu KURAUCHI
2017 ◽
Vol 122
(8)
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pp. 083301
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Steven J. Lanham
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Mark J. Kushner
1999 ◽
Vol 85
(8)
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pp. 3966-3975
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Mark A. Sobolewski
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James K. Olthoff
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Yicheng Wang
2013 ◽
Vol 22
(6)
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pp. 065008
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J B Lee
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H Y Chang
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S H Seo
2020 ◽
Vol 53
(33)
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pp. 335202
Zhiying Chen
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Roberto C Longo
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Michael Hummel
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Megan Carruth
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Joel Blakeney
◽
...
1999 ◽
Vol 42
(3)
◽
pp. 409-412
Takayoshi SAITOH
◽
Suguru SAIKI
◽
Toshiki KOBAYASHI
◽
Kazuhiro FUKUSHIMA
◽
Naoto KIKUCHI
◽
...