Microstructure evolution in hypereutectoid graphitic steel

Author(s):  
Seyyed-Amin Rounaghi ◽  
Ali-Reza Kiani-Rashid
2014 ◽  
Vol 29 (9) ◽  
pp. 941
Author(s):  
JIANG Jin-Long ◽  
WANG Qiong ◽  
HUANG Hao ◽  
ZHANG Xia ◽  
WANG Yu-Bao ◽  
...  

Alloy Digest ◽  
1969 ◽  
Vol 18 (3) ◽  

Abstract Dargraph is an oil-hardening, graphitic steel having excellent resistance to abrasive wear, galling, scuffing and scoring. It is recommended for drawing and forming dies, bushings, pneumatic hammers, wear plates, etc. This datasheet provides information on composition, hardness, and tensile properties as well as fracture toughness. It also includes information on forming, heat treating, machining, and joining. Filing Code: TS-216. Producer or source: Darwin & Milner Inc..


Alloy Digest ◽  
1958 ◽  
Vol 7 (3) ◽  

Abstract GRAPH-AL is a water or brine hardening graphitic steel used in applications which require shallow hardening properties and resistance to impact loading. This datasheet provides information on composition and hardness as well as fracture toughness. It also includes information on forming, heat treating, and machining. Filing Code: TS-68. Producer or source: Timken Roller Bearing Company.


Author(s):  
Wentao Qin ◽  
Dorai Iyer ◽  
Jim Morgan ◽  
Carroll Casteel ◽  
Robert Watkins ◽  
...  

Abstract Ni(5 at.%Pt ) films were silicided at a temperature below 400 °C and at 550 °C. The two silicidation temperatures had produced different responses to the subsequent metal etch. Catastrophic removal of the silicide was seen with the low silicidation temperature, while the desired etch selectivity was achieved with the high silicidation temperature. The surface microstructures developed were characterized with TEM and Auger depth profiling. The data correlate with both silicidation temperatures and ultimately the difference in the response to the metal etch. With the high silicidation temperature, there existed a thin Si-oxide film that was close to the surface and embedded with particles which contain metals. This thin film is expected to contribute significantly to the desired etch selectivity. The formation of this layer is interpreted thermodynamically.


2020 ◽  
Author(s):  
Yuanjiang Lv ◽  
Xin Xin Lian ◽  
Haoliang Sun ◽  
Xiaoxue Huang ◽  
Guang xin Wang

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