scholarly journals Submicron and nano surface patterning using nanosecond laser technique

2021 ◽  
Author(s):  
Ali Abdul-Kadhum Husein
Keyword(s):  
Femtosecond Laser ◽  
Pulse Energy ◽  
Repetition Rate ◽  
Laser System ◽  
Surface Patterning ◽  
Optical Path ◽  
Wafer Surface ◽  
Nanosecond Laser ◽  
Direct Writing ◽  
Laser Technique

Direct writing by laser techniques in the micro and nanostructuring scale is very important for the fabrication of new materials and multifunctional devices. They have proven to be very successful tools for precision machining and microfabrication with applications in optical devices, microelectronics, medical device, biomedical, defense applications, and MEMS. Focused nanosecond (ns) laser pulses can produce periodic structures and arrays pattern structures in semiconductors and thin metallic film on shaped surfaces. The achievable structure size is restricted by the wavelength and diffraction limit as well as it is determined by material properties and laser pulse stability. This thesis proposes a nanosecond laser nanostructuring technique in common optical path configuration to examine the limitations of the currently used fabrication methods and type of setups used; the competitive edge is using nanosecond lasers as a tool. Prospectively, this technology can be applied for femtosecond laser fabrication, because this is an easy, simple and common optical path configuration. For this experimental setup, the use of a common optical path configuration for automatic interference offers equals path lengths. It is not required for complicated optical setups while in femtosecond laser setups, it is extremely important to use path compensation in order to offer time delay for one laser beam due to a long path and more optical components. A low repetition rate, low power nanosecond laser system is investigated to preventing the (HAZ) conditions. The influence of the laser repetition rate and pulse energy on the size and quality of submicron features which fabricated on silicon wafers and thin gold film is investigated. In terms of nanomachining below the ablation threshold (surface patterning), the influence of laser fluence, repetition rate and pulse energy on the spacing as well as diameter of dots created on silicon wafer surface is examined. These studies show the capability of the proposed system of nanosecond laser in common optical path configuration in meeting the industry requirements.

scholarly journals Submicron and nano surface patterning using nanosecond laser technique

2021 ◽  
Author(s):  
Ali Abdul-Kadhum Husein
Keyword(s):  
Femtosecond Laser ◽  
Pulse Energy ◽  
Repetition Rate ◽  
Laser System ◽  
Surface Patterning ◽  
Optical Path ◽  
Wafer Surface ◽  
Nanosecond Laser ◽  
Direct Writing ◽  
Laser Technique

Direct writing by laser techniques in the micro and nanostructuring scale is very important for the fabrication of new materials and multifunctional devices. They have proven to be very successful tools for precision machining and microfabrication with applications in optical devices, microelectronics, medical device, biomedical, defense applications, and MEMS. Focused nanosecond (ns) laser pulses can produce periodic structures and arrays pattern structures in semiconductors and thin metallic film on shaped surfaces. The achievable structure size is restricted by the wavelength and diffraction limit as well as it is determined by material properties and laser pulse stability. This thesis proposes a nanosecond laser nanostructuring technique in common optical path configuration to examine the limitations of the currently used fabrication methods and type of setups used; the competitive edge is using nanosecond lasers as a tool. Prospectively, this technology can be applied for femtosecond laser fabrication, because this is an easy, simple and common optical path configuration. For this experimental setup, the use of a common optical path configuration for automatic interference offers equals path lengths. It is not required for complicated optical setups while in femtosecond laser setups, it is extremely important to use path compensation in order to offer time delay for one laser beam due to a long path and more optical components. A low repetition rate, low power nanosecond laser system is investigated to preventing the (HAZ) conditions. The influence of the laser repetition rate and pulse energy on the size and quality of submicron features which fabricated on silicon wafers and thin gold film is investigated. In terms of nanomachining below the ablation threshold (surface patterning), the influence of laser fluence, repetition rate and pulse energy on the spacing as well as diameter of dots created on silicon wafer surface is examined. These studies show the capability of the proposed system of nanosecond laser in common optical path configuration in meeting the industry requirements.

scholarly journals Femtosecond Laser Machining At Submicron And Nano Scale

2021 ◽  
Author(s):  
Alireza Dalili
Keyword(s):  
Femtosecond Laser ◽  
Pulse Energy ◽  
Repetition Rate ◽  
Pulse Width ◽  
Laser System ◽  
High Repetition Rate ◽  
Silicon Wafers ◽  
Good Precision ◽  
High Repetition ◽  
Nano Scale

The arrival of the femtosecond laser with a MHz repetition rate has provided the industry with a new tool to conduct submicron and nano scale machining. Several advantages such as high quality machining finish, good precision and high throughput can be obtained when using femtosecond laser to conduct nanomachining over lithography techniques currently in use. High repetition rate systems are preferred over low repetition rate femtosecond laser systems that have been studied by others due to their increased stability, speed, quality and discovery of new phenomena such as ripples and grains. This thesis proposes a high repetition rate fiber femtosecond laser system for meeting the above-mentioned conditions. The influence of the laser repetition rate and pulse energy on the size and quality of nano features fabricated on silicon wafers was investigated. Higher repetition rates led to smaller cutlines with uniform width. A 110 nm crater with a small heat affected zone of 0.79 µm was obtained at 13 MHz repetition rate and 2.042 J/cm² energy fluence. In terms of nanomachining below the ablation threshold (surface patterning), the influence of pulse width, repetition rate and pulse energy on the spacing of ripples, as well as diameter of grains created on silicon wafers, was examined. For the pulse width, repetition rate and pulse energy range used, the ripple spacing and grain diameter increased with laser pulse duration while other parameters did not play a significant role. These results show the capability of the proposed system in meeting the industry requirements.

scholarly journals Femtosecond Laser Machining At Submicron And Nano Scale

2021 ◽  
Author(s):  
Alireza Dalili
Keyword(s):  
Femtosecond Laser ◽  
Pulse Energy ◽  
Repetition Rate ◽  
Pulse Width ◽  
Laser System ◽  
High Repetition Rate ◽  
Silicon Wafers ◽  
Good Precision ◽  
High Repetition ◽  
Nano Scale

The arrival of the femtosecond laser with a MHz repetition rate has provided the industry with a new tool to conduct submicron and nano scale machining. Several advantages such as high quality machining finish, good precision and high throughput can be obtained when using femtosecond laser to conduct nanomachining over lithography techniques currently in use. High repetition rate systems are preferred over low repetition rate femtosecond laser systems that have been studied by others due to their increased stability, speed, quality and discovery of new phenomena such as ripples and grains. This thesis proposes a high repetition rate fiber femtosecond laser system for meeting the above-mentioned conditions. The influence of the laser repetition rate and pulse energy on the size and quality of nano features fabricated on silicon wafers was investigated. Higher repetition rates led to smaller cutlines with uniform width. A 110 nm crater with a small heat affected zone of 0.79 µm was obtained at 13 MHz repetition rate and 2.042 J/cm² energy fluence. In terms of nanomachining below the ablation threshold (surface patterning), the influence of pulse width, repetition rate and pulse energy on the spacing of ripples, as well as diameter of grains created on silicon wafers, was examined. For the pulse width, repetition rate and pulse energy range used, the ripple spacing and grain diameter increased with laser pulse duration while other parameters did not play a significant role. These results show the capability of the proposed system in meeting the industry requirements.

Direct Writing Micro-Structure on 65Mn by Femtosecond Laser

2013 ◽  
Vol 291-294 ◽  
pp. 2734-2737
Author(s):  
Jian Ting Xu ◽  
Dong Qing Yuan
Keyword(s):  
Femtosecond Laser ◽  
Pulse Energy ◽  
Repetition Rate ◽  
Pulse Length ◽  
Direct Writing ◽  
Micro Structure ◽  
Circle Pattern ◽  
Scan Speed ◽  
Line Process ◽  
Regular Line

Regular line and circle arry micro-apparatus on 65Mn plate formed by femtosecond direct writting with wavelength of 800 nm, repetition rate of 1 kHz and the pulse length of 130fs in air. Investigate the effect of pulse energy and scan speed. Found, that the increased scan speed was similar to the decreased pulse energy. Due to the circle pattern was different to the line process, the contrary phenomenon appeared, which with increased ablation energy, the width of groove was less and the depth was increased.

Repetition rate-tunable high power fiber femtosecond laser system

2012 ◽  
Author(s):  
Yunseok Kim ◽  
Seungman Kim ◽  
Seunghwoi Han ◽  
Sanguk Park ◽  
Jiyong Park ◽  
...  
Keyword(s):  
Femtosecond Laser ◽  
High Power ◽  
Repetition Rate ◽  
Laser System

Direct writing of sub-wavelength ripples on silicon using femtosecond laser at high repetition rate

2016 ◽  
Vol 360 ◽  
pp. 896-903 ◽  
Author(s):  
Changxin Xie ◽  
Xiaohong Li ◽  
Kaijun Liu ◽  
Min Zhu ◽  
Rong Qiu ◽  
...  
Keyword(s):  
Femtosecond Laser ◽  
Repetition Rate ◽  
High Repetition Rate ◽  
Direct Writing ◽  
High Repetition ◽  
Sub Wavelength

scholarly journals High-energy hybrid femtosecond laser system demonstrating 2 × 10 PW capability

2020 ◽  
Vol 8 ◽  
Author(s):  
François Lureau ◽  
Guillaume Matras ◽  
Olivier Chalus ◽  
Christophe Derycke ◽  
Thomas Morbieu ◽  
...  
Keyword(s):  
Femtosecond Laser ◽  
Repetition Rate ◽  
Nuclear Physics ◽  
Laser System ◽  
Output Pulse ◽  
High Energy ◽  
Barium Borate ◽  
Femtosecond Pulses ◽  
Chirped Pulse ◽  
Pulse Amplifier

Abstract We report on a two-arm hybrid high-power laser system (HPLS) able to deliver 2 × 10 PW femtosecond pulses, developed at the Bucharest-Magurele Extreme Light Infrastructure Nuclear Physics (ELI-NP) Facility. A hybrid front-end (FE) based on a Ti:sapphire chirped pulse amplifier and a picosecond optical parametric chirped pulse amplifier based on beta barium borate (BBO) crystals, with a cross-polarized wave (XPW) filter in between, has been developed. It delivers 10 mJ laser pulses, at 10 Hz repetition rate, with more than 70 nm spectral bandwidth and high-intensity contrast, in the range of 1013:1. The high-energy Ti:sapphire amplifier stages of both arms were seeded from this common FE. The final high-energy amplifier, equipped with a 200 mm diameter Ti:sapphire crystal, has been pumped by six 100 J nanosecond frequency doubled Nd:glass lasers, at 1 pulse/min repetition rate. More than 300 J output pulse energy has been obtained by pumping with only 80% of the whole 600 J available pump energy. The compressor has a transmission efficiency of 74% and an output pulse duration of 22.7 fs was measured, thus demonstrating that the dual-arm HPLS has the capacity to generate 10 PW peak power femtosecond pulses. The reported results represent the cornerstone of the ELI-NP 2 × 10 PW femtosecond laser facility, devoted to fundamental and applied nuclear physics research.

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