Regimes of substrates processing and deposition nanofilms using the laser-plasma method

The physical processes occurring in a laser-plasma source is used for deposition nanostructures. The laser-plasma source is an erosion laser plume of the target material and a substrate located in a vacuum chamber. It has been proposed to place a grid between the laser target and the substrate. A negative potential is applied to the grid relative to the laser target to smoothly adjust the parameters of the particles deposited on the substrate. As a result, a particles flow is formed after a grid. This particle flow is predominantly consisting of ions. The energy of the ions can be reliably and smoothly controlled by applying a positive potential to the grid relative to the substrate. It has been experimentally proved method for deposition of nanofilms using ion beams from the laser plasma. It has been shown that different regimes of substrate surface treatment can be implemented in the laser-plasma source for deposition nanostructures. Using this source, you can sequentially clean the surface of the substrate without depressurizing the vacuum chamber, and create a pseudodiffusion layer of the laser target material near the surface layer of the substrate. It will allow producing it possible to obtain highly adhesive nanofilms with predetermined parameters.

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The spatial density distribution of the ion flux in the laser-plasma source for deposition of nanocoating on substrates of increased size

Journal of the Belarusian State University. Physics ◽

10.33581/2520-2243-2021-2-81-87 ◽

2021 ◽

pp. 81-87

Author(s):

Victor K. Goncharov ◽

Michail V. Puzyrev ◽

Valery Yu. Stupakevich ◽

Nikita I. Shulhan

Keyword(s):

Flux Density ◽

Laser Plasma ◽

Vacuum Chamber ◽

Target Material ◽

Plasma Source ◽

Secondary Emission ◽

Ion Flux ◽

Spatial Density ◽

Laser Target ◽

Near Surface

The present work is devoted to the experimental determination of the uniformity of the ion flux density on a substrate with an increased size (~200 cm2 ) in order to form nanostructures by the laser-plasma method. The system for deposition of nanostructures consists of an erosion laser torch of the target material and a substrate located in a vacuum chamber. For smooth adjustment of the parameters of the deposited particles on the substrate, a grid is located between the laser target and the substrate, on which a negative potential is applied relative to the laser target. As a result, a particle stream is formed after the grid, consisting mainly of ions, whose energy can be reliably and smoothly controlled by applying a positive potential to the grid in relation to the substrate. Experiments have shown that the uniformity of the density of ion fluxes on a substrate of increased size (~200 cm2 ) in a laser-plasma source for nanocoating can be increased by applying an accelerating potential to the substrate in relation to the grid. The minimum difference between the ion flux density in the center of the target and at its edge can be reduced to ~5 %. As a result, it is technologically possible to clean the surface of the substrate with ions of the laser target material (secondary emission), create a pseudodiffusion layer of the target material in the near-surface region of the substrate, and apply the laser target material to the substrate. At the same time, all these operations can be performed sequentially without depressurising the vacuum chamber. This allows obtaining coating with good adhesion on substrates of increased size.

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{10} edge dislocations in YSZ films grown on (100)MgO by PLD

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s0424820100170384 ◽

1994 ◽

Vol 52 ◽

pp. 530-531

Author(s):

Jason R. Heffelfinger ◽

C. Barry Carter

Keyword(s):

Thin Films ◽

Semiconductor Lasers ◽

Vapor Deposition ◽

Substrate Surface ◽

Laser System ◽

Average Energy ◽

Target Material ◽

Chemical Vapor ◽

Buffer Layers ◽

Organic Chemical

Yttria-stabilized zirconia (YSZ) is currently used in a variety of applications including oxygen sensors, fuel cells, coatings for semiconductor lasers, and buffer layers for high-temperature superconducting films. Thin films of YSZ have been grown by metal-organic chemical vapor deposition, electrochemical vapor deposition, pulse-laser deposition (PLD), electron-beam evaporation, and sputtering. In this investigation, PLD was used to grow thin films of YSZ on (100) MgO substrates. This system proves to be an interesting example of relationships between interfaces and extrinsic dislocations in thin films of YSZ.In this experiment, a freshly cleaved (100) MgO substrate surface was prepared for deposition by cleaving a lmm-thick slice from a single-crystal MgO cube. The YSZ target material which contained 10mol% yttria was prepared from powders and sintered to 85% of theoretical density. The laser system used for the depositions was a Lambda Physik 210i excimer laser operating with KrF (λ=248nm, 1Hz repetition rate, average energy per pulse of 100mJ).

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Status of the liquid-xenon-jet laser-plasma source for EUV lithography

10.1117/12.472274 ◽

2002 ◽

Cited By ~ 20

Author(s):

Bjoern A. M. Hansson ◽

Lars Rymell ◽

Magnus Berglund ◽

Oscar E. Hemberg ◽

Emmanuelle Janin ◽

...

Keyword(s):

Laser Plasma ◽

Plasma Source ◽

Liquid Xenon ◽

Euv Lithography

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Dynamic Material Response of Aluminum Single Crystal Under Microscale Laser Shock Peening

Journal of Manufacturing Science and Engineering ◽

10.1115/1.3106034 ◽

2009 ◽

Vol 131 (3) ◽

Cited By ~ 7

Author(s):

Sinisa Vukelic ◽

Youneng Wang ◽

Jeffrey W. Kysar ◽

Y. Lawrence Yao

Keyword(s):

Residual Stresses ◽

Single Crystals ◽

Electron Backscatter Diffraction ◽

Target Material ◽

Laser Shock Peening ◽

Laser Shock ◽

Laser Target ◽

Aluminum Single Crystal ◽

Anisotropic Mechanical Properties ◽

Shock Peening

The process of laser shock peening induces compressive residual stresses in a material to improve material fatigue life. For micron sized laser beams, the size of the laser-target interaction zone is of the same order of magnitude as the target material grains, and thus the target material must be considered as being anisotropic and inhomogeneous. Single crystals are chosen to study the effects of the anisotropic mechanical properties. It is also of interest to investigate the response of symmetric and asymmetric slip systems with respect to the shocked surface. In the present study, numerical and experimental aspects of laser shock peening on two different crystal surfaces (110) and (11¯4) of aluminum single crystals are studied. Lattice rotations on the top surface and cross section are measured using electron backscatter diffraction, while residual stress is characterized using X-ray microdiffraction. A numerical model has been developed that takes into account anisotropy as well as inertial terms to predict the size and nature of the deformation and residual stresses. Obtained results were compared with the experimental finding for validation purpose.

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