Structural Disordering and Relaxation Process in an Amorphous Alloy

2011 ◽  
Vol 49 (11) ◽  
2008 ◽  
Vol 92 (15) ◽  
pp. 151906 ◽  
Author(s):  
Sang-Chul Lee ◽  
Chang-Myeon Lee ◽  
Jae-Chul Lee ◽  
Hwi-Jun Kim ◽  
Yoji Shibutani ◽  
...  

2000 ◽  
Vol 2000.49 (0) ◽  
pp. 243-244
Author(s):  
Kiyomoto Ito ◽  
Sigeo Kotake ◽  
Yasuyuki Suzuki ◽  
Masafumi Senoo

2009 ◽  
Vol 41 (3) ◽  
pp. 283-291 ◽  
Author(s):  
A. Kalezic-Glisovic ◽  
V.A. Maricic ◽  
D.A. Kosanovic ◽  
S. Djukic ◽  
R. Simeunovic

The structural changes effect on functional properties of ribbon shaped samples of the Fe81B13Si4C2 amorphous alloy during annealing process was investigated in this paper. Differential scanning calorimetry method has shown that this alloy crystallizes in one stage, in temperature range from room temperature up to 700?C. Structural relaxation process was investigated by sensitive dilatation method in nonisothermal and isothermal conditions. It has been shown that structural relaxation process occurs in two stages by measuring thermal expansion at constant temperatures of t1=420?C, t2 = 440?C and t3 = 460?C. The first stage is characterized by linear logarithmic dependence of thermal expansion upon time at constant temperature. The second stage of structural relaxation process is characterized by linear dependence of isothermal expansion upon the square root of process time. These results imply that the first stage of structural relaxation process is a rapid kinetic process, while the second stage of structural relaxation process is a slow diffusion process. The rate constants k11 = 2,27?10- 3 s-1, k12 = 2,79?10-3 s-1, k13 = 3,6?10-3 s-1, k21 = 0,67?10-4 s-1, k22 = 3,72?10-4 s-1, k23 = 21,53?10-4 s-1 and activation energies E1 = 48,64 kJ/mol and E2 = 366, 23 kJ/mol were determined for both stages of structural relaxation process. The distinct correlation between structural relaxation process and magnetic susceptibility relative change was determined by thermomagnetic measurements. It has been shown that magnetic susceptibility can be increased by up to 80%, by convenient annealings after structural relaxation process, at magnetic field intensity of 8 kA/m.


2005 ◽  
Vol 37 (3) ◽  
pp. 231-235 ◽  
Author(s):  
S.R. Djukic ◽  
Radojko Simeunovic ◽  
Aleksa Maricic

The crystallization process of the Co84Fe5.3Si8.5B2.2 amorphous alloy examined by differential scanning calorimetry (DSC) exhibits three exothermal steps at Tcr1=649K, Tcr2=800K, and Tcr3=838K. The rate constants of the first relaxation process (determined at 598K and 623K) are k1=5*10-4 s and k2=8*10-4 s and the corresponding activation energy Ea1=26.23 kJ/mol. The data for the relaxation process before the second crystallization step (determined at 683K and 713K) are k3=14.5*10-4 s and k4=17.5*10-4 s and the corresponding activation energy Ea2=60.0 kJ/mol. The process of structural relaxation in non-isothermal and isothermal conditions was studied by analysis of the results of measurements of the thermo electromotive force (TEMF). From the change of the temperature coefficient of TEMF that follows each annealing process, the relative electronic state density changes at the Fermi level were determined: ?N21/N2=5,45%, ?N22/N2=5,76%, ?N23/N2=7,57% and ?N24/N2=9,85%.


Author(s):  
T. Sato ◽  
S. Kitamura ◽  
T. Sueyoshl ◽  
M. Iwatukl ◽  
C. Nielsen

Recently, the growth process and relaxation process of crystalline structures were studied by observing a SI nano-pyramid which was built on a Si surface with a UHV-STM. A UHV-STM (JEOL JSTM-4000×V) was used for studying a heated specimen, and the specimen was kept at high temperature during observation. In this study, the nano-fabrication technique utilizing the electromigration effect between the STM tip and the specimen was applied. We observed Si atoms migrated towords the tip on a high temperature Si surface.Clean surfaces of Si(lll)7×7 and Si(001)2×l were prepared In the UHV-STM at a temperature of approximately 600 °C. A Si nano-pyramid was built on the Si surface at a tunneling current of l0nA and a specimen bias voltage of approximately 0V in both polarities. During the formation of the pyramid, Images could not be observed because the tip was stopped on the sample. After the formation was completed, the pyramid Image was observed with the same tip. After Imaging was started again, the relaxation process of the pyramid started due to thermal effect.


2015 ◽  
Vol 8 (3) ◽  
pp. 2176-2188 ◽  
Author(s):  
Keisham Nanao Singh

This article reports on the Dielectric Relaxation Studies of two Liquid Crystalline compounds - 7O.4 and 7O.6 - doped with dodecanethiol capped Silver Nanoparticles. The liquid crystal molecules are aligned homeotropically using CTAB. The low frequency relaxation process occurring above 1 MHz is fitted to Cole-Cole formula using the software Dielectric Spectra fit. The effect of the Silver Nanoparticles on the molecular dipole dynamics are discussed in terms of the fitted relaxation times, Cole-Cole distribution parameter and activation energy. The study indicate a local molecular rearrangement of the liquid crystal molecules without affecting the order of the bulk liquid crystal molecules but these local molecules surrounding the Silver Nanoparticles do not contribute to the relaxation process in the studied frequency range. The observed effect on activation energy suggests a change in interaction between the nanoparticles/liquid crystal molecules.


2013 ◽  
Vol 33 (8) ◽  
pp. 1374-1382
Author(s):  
Shaowei YAN ◽  
Hui FAN ◽  
Chuan LIANG ◽  
Zhong LI ◽  
Zhihui YU

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