High-Resolution Magnetic Force Microscope Tip Coated with Co Film Prepared by Ultra-High Vacuum Evaporation

In recent years, the magnetic force microscope (MFM) has been used not only for the evaluation of magnetic media but also for the measurement of magnetic characteristics of quantum dots as well as in various fields, because the MFM can visualize magnetic field on the sample surface with the high resolution. The MFM observation in ultra-high vacuum (UHV) requires to reduce the adsorption layer on the sample surface for high resolution observation. The slope detection mode using the variation of vibrating cantilever is basically unstable in UHV due to the increase in the Q factor of the cantilever. Accordingly it has been used for the MFM observation in air. On the other hand, the FM detection technique offers a very high sensitivity because of the high Q factor.This repot describes the MFM technique to take a magnetic image steadily in UHV. We observed the surface of a magnetic material with MFM technique in UHV, and compared the slope detection technique, the phase detection technique using phase variation of cantilever vibration, and the FM detection technique.

Download Full-text

The High Resolution Scanning Transmission Electron Microscope

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s0424820100051591 ◽

1974 ◽

Vol 32 ◽

pp. 316-317

Author(s):

A. V. Crewe

Keyword(s):

Electron Microscope ◽

High Resolution ◽

High Vacuum ◽

Scanning Transmission Electron Microscope ◽

Ultra High Vacuum ◽

Resolving Power ◽

Imaging Characteristics ◽

Transmission Electron ◽

Scanning Transmission ◽

The Moment

The high resolution STEM is now a fact of life. I think that we have, in the last few years, demonstrated that this instrument is capable of the same resolving power as a CEM but is sufficiently different in its imaging characteristics to offer some real advantages.It seems possible to prove in a quite general way that only a field emission source can give adequate intensity for the highest resolution^ and at the moment this means operating at ultra high vacuum levels. Our experience, however, is that neither the source nor the vacuum are difficult to manage and indeed are simpler than many other systems and substantially trouble-free.

Download Full-text

Fabrication of Magnetic Tips for High-Resolution Magnetic Force Microscopy

Key Engineering Materials ◽

10.4028/www.scientific.net/kem.543.35 ◽

2013 ◽

Vol 543 ◽

pp. 35-38 ◽

Cited By ~ 2

Author(s):

Masaaki Futamoto ◽

Tatsuya Hagami ◽

Shinji Ishihara ◽

Kazuki Soneta ◽

Mitsuru Ohtake

Keyword(s):

Magnetic Material ◽

High Resolution ◽

Magnetic Force Microscopy ◽

Magnetic Force ◽

Magnetic Force Microscope ◽

Force Microscopy ◽

High Magnetic Moment ◽

Tip Radius ◽

Better Than ◽

Sputtering System

Effects of magnetic material, coating thickness, and tip radius on magnetic force microscope (MFM) spatial resolution have been systematically investigated. MFM tips are prepared by using an UHV sputtering system by coating magnetic materials on non-magnetic Si tips employing targets of Ni, Ni-Fe, Co, Fe, Fe-B, and Fe-Pd. MFM spatial resolutions better than 9 nm have been confirmed by employing magnetic tips coated with high magnetic moment materials with optimized thicknesses.

Download Full-text

Set-up of a high-resolution 300 mK atomic force microscope in an ultra-high vacuum compatible 3He/10 T cryostat

Review of Scientific Instruments ◽

10.1063/1.4955448 ◽

2016 ◽

Vol 87 (7) ◽

pp. 073702 ◽

Cited By ~ 3

Author(s):

H. von Allwörden ◽

K. Ruschmeier ◽

A. Köhler ◽

T. Eelbo ◽

A. Schwarz ◽

...

Keyword(s):

High Resolution ◽

Atomic Force Microscope ◽

High Vacuum ◽

Ultra High Vacuum ◽

Atomic Force ◽

Set Up

Download Full-text

Shadow Edge Lithography and Application to Nanofluidics

ASME 2010 First Global Congress on NanoEngineering for Medicine and Biology ◽

10.1115/nemb2010-13307 ◽

2010 ◽

Author(s):

Woon-Hong Yeo ◽

Dong Won Lee ◽

Kyong-Hoon Lee ◽

Jae-Hyun Chung

Keyword(s):

Fuel Cells ◽

High Resolution ◽

High Throughput ◽

Single Molecule ◽

Chemical Sensors ◽

Geometric Distribution ◽

High Vacuum ◽

Vacuum Evaporation ◽

Wafer Scale ◽

Nanoscale Patterns

Many upcoming applications, such as nanoelectronic circuitry, single-molecule based chips, nanofluidics, chemical sensors, and fuel cells, require large arrays of nanochannels and nanowires. To commercialize such nanostructured devices, a high resolution and high throughput patterning method is essential. For this purpose, we developed the shadow edge lithography (SEL) as a wafer-scale, high-throughput nanomanufacturing method [1]. In the proposed method, the shadow effect in the high-vacuum evaporation was theoretically analyzed to predict the geometric distribution of the nanoscale patterns [2]. In experiment, nanoscale patterns were created by the shadow of aluminum (Al) edges that were prepatterned using a conventional microfabrication method.

Download Full-text