scholarly journals Plasma Etching Behavior of YOF Coating Deposited by Suspension Plasma Spraying in Inductively Coupled CHF3/Ar Plasma

Coatings ◽  
2020 ◽  
Vol 10 (11) ◽  
pp. 1023
Author(s):  
Seungjun Lee ◽  
Jaehoo Lee ◽  
Woongsik Kim ◽  
Nong-Moon Hwang
Keyword(s):  
Plasma Spraying ◽  
Plasma Etching ◽  
Suspension Plasma Spraying ◽  
X Ray ◽  
Inductively Coupled ◽  
Fluorocarbon Plasma ◽  
Before And After ◽  
Etching Behavior ◽  
Ar Plasma ◽  
Y2o3 Coating

Dense yttrium oxyfluoride (YOF) coating was successfully deposited by suspension plasma spraying (SPS) with coaxial feeding. After deposition for 6 min at a plasma power of 105 kW, the thickness of the YOF coating was 55 ± 3.2 µm with a porosity of 0.15% ± 0.01% and the coating rate was ~9.2 µm/min. The crystalline structure of trigonal YOF was confirmed by X-ray diffractometry (XRD). The etching behavior of the YOF coating was studied using inductively coupled CHF3/Ar plasma in comparison with those of the Al2O3 bulk and Y2O3 coating. Crater-like erosion sites and cavities were formed on the whole surface of the Al2O3 bulk and Y2O3 coating. In contrast, the surface of the YOF coating showed no noticeable difference before and after exposure to the CHF3/Ar plasma. Such high resistance of the YOF coating to fluorocarbon plasma comes from the strongly fluorinated layer on the surface. The fluorination on the surface of materials was confirmed by X-ray photoelectron spectrum analysis (XPS). Depth profiles of the compositions of Al2O3, Y2O3, and YOF samples by XPS revealed that the fluorination layer of the YOF coating was much thicker than those of Al2O3 and Y2O3. These results indicate that if the inner wall of the semiconductor process chamber is coated by YOF using SPS, the generation of contamination particles would be minimized during the fluorocarbon plasma etching process.

Effects of the inductively coupled Ar plasma etching on the performance of (111) face CdZnTe detector

2020 ◽  
Vol 109 ◽  
pp. 104929 ◽  
Author(s):  
Bing Song ◽  
Jijun Zhang ◽  
Xiaoyan Liang ◽  
Shuhao Zhao ◽  
Jiahua Min ◽  
...  
Keyword(s):  
Plasma Etching ◽  
Cdznte Detector ◽  
Inductively Coupled ◽  
Ar Plasma

scholarly journals Structural and Fluorine Plasma Etching Behavior of Sputter-Deposition Yttrium Fluoride Film

Nanomaterials ◽  
2018 ◽  
Vol 8 (11) ◽  
pp. 936 ◽  
Author(s):  
Wei-Kai Wang ◽  
Yu-Xiu Lin ◽  
Yi-Jie Xu
Keyword(s):  
Plasma Etching ◽  
Photoelectron Spectroscopy ◽  
Heating Temperature ◽  
Working Pressure ◽  
Etching Depth ◽  
Yttrium Fluoride ◽  
X Ray ◽  
Substrate Heating ◽  
Etching Behavior ◽  
Etched Surface

Yttrium fluoride (YF3) films were grown on sapphire substrate by a radio frequency magnetron using a commercial ceramic target in a vacuum chamber. The structure, composition, and plasma etching behavior of the films were systematically investigated. The YF3 film was deposited at a working pressure of 5 mTorr and an RF power of 150 W. The substrate-heating temperature was increased from 400 to 700 °C in increments of 100 °C. High-resolution transmission electron microscopy (HRTEM) and X-ray diffraction results confirmed an orthorhombic YF3 structure was obtained at a substrate temperature of 700 °C for 2 h. X-ray photoelectron spectroscopy revealed a strongly fluorinated bond (Y–F bond) on the etched surface of the YF3 films. HRTEM analysis also revealed that the YF3 films became yttrium-oxyfluorinated after exposure to fluorocarbon plasma. The etching depth was three times lower on YF3 film than on Al2O3 plate. These results showed that the YF3 films have excellent erosion resistance properties compared to Al2O3 plates.

scholarly journals A Study of the Composition and Dissolution of Jianshui Purple Pottery in Yunnan, China

Crystals ◽  
2021 ◽  
Vol 11 (9) ◽  
pp. 1034
Author(s):  
Chang Liu ◽  
Heng Xie ◽  
Lei Nie ◽  
Hong Wang ◽  
Yuanyuan He
Keyword(s):  
Inductively Coupled Plasma ◽  
Theoretical Basis ◽  
Pottery Production ◽  
X Ray ◽  
Inductively Coupled ◽  
Dissolution Tests ◽  
Before And After ◽  
Plasma Mass Spectrometry ◽  
History Of ◽  
Composition Changes

Pottery is a gem in the history of human civilization and a crystallization of human wisdom. Yunnan Jianshui purple pottery is one of the four famous types of pottery in China, with a long history and superb craftsmanship. Used as tableware, research on the composition and element dissolution of pottery is extremely significant for production and health. This paper takes Jianshui purple pottery as its research object, samples its raw ores and finished products, and conducts X-ray fluorescence, scanning electron microscopy, inductively coupled plasma mass spectrometry experiments, and dissolution tests. The chemical composition, microstructure, and trace element concentrations of pottery before and after firing were measured. Results show that the dissolution of purple pottery under various use scenarios is low and meets health requirements. Combined with the characteristics of purple pottery, the composition changes and the mechanism of change before and after firing are discussed, which can be used as the theoretical basis for improving pottery production in the future.

Suspension Plasma Spraying for the Preparation of Perovskite Powders and Coatings

1997 ◽  
Author(s):  
G. Schiller ◽  
M. Müller ◽  
F. Gitzhofer
Keyword(s):  
Liquid Phase ◽  
Plasma Spraying ◽  
Inductively Coupled Plasma ◽  
Oxygen Plasma ◽  
Ethanol Solution ◽  
Suspension Plasma Spraying ◽  
Plasma Sheath ◽  
Molar Ratio ◽  
Inductively Coupled ◽  
Reactor Pressure

Abstract LaMnO3 powders and coatings have been prepared by reactive suspension plasma spraying (SPS) of MnO2 powders and LaCl3 solutions. A 40 kW inductively coupled plasma with an oxygen plasma sheath gas has been used. Water and ethanol have been tested as the liquid phase in the SPS process. High perovskite content (70-90%) has been achieved for both powders and coatings when spraying a suspension of fine MnO2 powder in a saturated ethanol solution of LaCl3 with a 1:1 molar ratio of La and Mn. Materials obtained by a 1100 °C oven treatment have been used as reference during the study. The reactor pressure was varied from 30 to 80 kPa. Low pressure was found to be necessary to suppress the formation of undesired phases in the powders and coatings obtained. A plasma post treatment of the coatings results in an increase of the perovskite content.

scholarly journals Inductively coupled BCl3/Cl2/Ar plasma etching of Al-rich AlGaN

2016 ◽  
Vol 35 (2) ◽  
pp. 021305 ◽  
Author(s):  
Erica A. Douglas ◽  
Carlos A. Sanchez ◽  
Robert J. Kaplar ◽  
Andrew A. Allerman ◽  
Albert G. Baca
Keyword(s):  
Plasma Etching ◽  
Inductively Coupled ◽  
Ar Plasma

scholarly journals Reactivity of Metakaolin in Alkaline Environment: Correlation of Results from Dissolution Experiments with XRD Quantifications

Materials ◽  
2020 ◽  
Vol 13 (10) ◽  
pp. 2214
Author(s):  
Sebastian Scherb ◽  
Mathias Köberl ◽  
Nancy Beuntner ◽  
Karl-Christian Thienel ◽  
Jürgen Neubauer
Keyword(s):  
Inductively Coupled Plasma ◽  
Optical Emission ◽  
Systematic Investigation ◽  
Attenuated Total Reflection ◽  
Emission Spectrometry ◽  
Alkaline Solutions ◽  
X Ray ◽  
Inductively Coupled ◽  
Before And After ◽  
Congruent Dissolution

Systematic investigation of filtrates and filter residues resulting from a 24 h treatment of metakaolin in different alkaline solutions were performed. On filtered metakaolin particles, inductively coupled plasma-optical emission spectrometry (ICP-OES) measurements reveal an enrichment of iron and titanium, which suggests an inhomogeneous distribution of these cations. Since the SiO2/Al2O3 ratio remains constant in all filter residues examined, the dissolution of the Si and Al monomers is congruent. Structural differences, identified by attenuated total reflection–Fourier transform infrared spectroscopy (ATR-FTIR) as a consequence of alkali uptake, influence the X-ray scattering contribution of metakaolin, and thus quantifications with the partial or no known crystal structure (PONKCS) method. This leads to deviations between the degree of reaction calculated from Si and Al solubility from filtrate and that quantified by quantitative powder X-ray diffraction (QPXRD) using the filter residue. Nevertheless, the described changes do not cause a shift in the X-ray amorphous hump in case of congruent dissolution, and thus allow the quantification of the metakaolin before and after dissolution with the same hkl-phase model.

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