Surface chemical analysis � Scanningprobe microscopy � Determination of geometric quantities using SPM: Calibration of measuring systems

Mapping Intimacies ◽

10.3403/30314300u ◽

2019 ◽

Keyword(s):

Chemical Analysis ◽

Surface Chemical ◽

Measuring Systems ◽

Surface Chemical Analysis

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Surface chemical analysis � Scanningprobe microscopy � Determination of geometric quantities using SPM: Calibration of measuring systems

10.3403/30314300 ◽

2019 ◽

Keyword(s):

Chemical Analysis ◽

Surface Chemical ◽

Measuring Systems ◽

Surface Chemical Analysis

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Surface chemical analysis. Secondary-ion mass spectrometry. Determination of boron atomic concentration in silicon using uniformly doped materials

10.3403/02007712 ◽

2000 ◽

Keyword(s):

Mass Spectrometry ◽

Chemical Analysis ◽

Secondary Ion Mass Spectrometry ◽

Surface Chemical ◽

Atomic Concentration ◽

Ion Mass Spectrometry ◽

Doped Materials ◽

Secondary Ion ◽

Surface Chemical Analysis

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Surface chemical analysis. Auger electron spectroscopy and X-ray photoelectron spectroscopy. Determination of lateral resolution, analysis area, and sample area viewed by the analyser

10.3403/30124424 ◽

2005 ◽

Keyword(s):

Chemical Analysis ◽

Auger Electron Spectroscopy ◽

Photoelectron Spectroscopy ◽

Electron Spectroscopy ◽

Auger Electron ◽

Surface Chemical ◽

X Ray ◽

Resolution Analysis ◽

Surface Chemical Analysis

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Surface chemical analysis. Secondary-ion mass spectrometry. Determination of boron atomic concentration in silicon using uniformly doped materials

10.3403/30153671 ◽

2010 ◽

Keyword(s):

Mass Spectrometry ◽

Chemical Analysis ◽

Secondary Ion Mass Spectrometry ◽

Surface Chemical ◽

Atomic Concentration ◽

Ion Mass Spectrometry ◽

Doped Materials ◽

Secondary Ion ◽

Surface Chemical Analysis

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Surface chemical analysis. Scanning-probe microscopy. Determination of cantilever normal spring constants

10.3403/30199161 ◽

2015 ◽

Keyword(s):

Chemical Analysis ◽

Scanning Probe Microscopy ◽

Scanning Probe ◽

Surface Chemical ◽

Probe Microscopy ◽

Spring Constants ◽

Surface Chemical Analysis

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Surface chemical analysis. Determination of surface elemental contamination on silicon wafers by total-reflection X-ray fluorescence (TXRF) spectroscopy

10.3403/02222256u ◽

2015 ◽

Keyword(s):

Chemical Analysis ◽

Silicon Wafers ◽

Total Reflection ◽

Surface Chemical ◽

X Ray ◽

Surface Chemical Analysis ◽

Analysis Determination

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Surface chemical analysis. Auger electron spectroscopy and X-ray photoelectron spectroscopy. Determination of lateral resolution

10.3403/30124110 ◽

2006 ◽

Keyword(s):

Chemical Analysis ◽

Auger Electron Spectroscopy ◽

Photoelectron Spectroscopy ◽

Electron Spectroscopy ◽

Auger Electron ◽

Lateral Resolution ◽

Surface Chemical ◽

X Ray ◽

Surface Chemical Analysis

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Surface chemical analysis � Secondary-ion mass spectrometry � Determination of relative sensitivity factors from ion-implanted reference materials

10.3403/30409890 ◽

2021 ◽

Keyword(s):

Mass Spectrometry ◽

Chemical Analysis ◽

Reference Materials ◽

Secondary Ion Mass Spectrometry ◽

Relative Sensitivity ◽

Surface Chemical ◽

Sensitivity Factors ◽

Secondary Ion ◽

Surface Chemical Analysis

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Summary of ISO/TC 201 Technical Report: ISO/TR 19319:2013 - Surface chemical analysis - Fundamental approaches to determination of lateral resolution and sharpness in beam-based methods

Surface and Interface Analysis ◽

10.1002/sia.5294 ◽

2013 ◽

Vol 45 (9) ◽

pp. 1313-1316 ◽

Author(s):

M. Senoner ◽

W. E. S. Unger

Keyword(s):

Chemical Analysis ◽

Lateral Resolution ◽

Surface Chemical ◽

Technical Report ◽

Surface Chemical Analysis

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Surface chemical analysis. Secondary-ion mass spectrometry. Determination of relative sensitivity factors from ion-implanted reference materials

10.3403/02867800 ◽

2003 ◽

Keyword(s):

Mass Spectrometry ◽

Chemical Analysis ◽

Reference Materials ◽

Secondary Ion Mass Spectrometry ◽

Relative Sensitivity ◽

Surface Chemical ◽

Sensitivity Factors ◽

Secondary Ion ◽

Surface Chemical Analysis

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