scholarly journals A Study on the Structural, Morphological and Optical Properties of Cu2-xse Thin Films Deposited by Thermal Evaporation

Author(s):  
Makbule TERLEMEZOĞLU
2016 ◽  
Vol 12 (3) ◽  
pp. 4394-4399
Author(s):  
Sura Ali Noaman ◽  
Rashid Owaid Kadhim ◽  
Saleem Azara Hussain

Tin Oxide and Indium doped Tin Oxide (SnO2:In) thin films were deposited on glass and Silicon  substrates  by  thermal evaporation technique.  X-ray diffraction pattern of  pure SnO2 and SnO2:In thin films annealed at 650oC and the results showed  that the structure have tetragonal phase with preferred orientation in (110) plane. AFM studies showed an inhibition of grain growth with increase in indium concentration. SEM studies of pure  SnO2 and  Indium doped tin oxide (SnO2:In) ) thin films showed that the films with regular distribution of particles and they have spherical shape.  Optical properties such as  Transmission , optical band-gap have been measured and calculated.


2018 ◽  
Vol 26 (10) ◽  
pp. 249-256
Author(s):  
Waleed Khalid Kadhim

In this paper I present the preparation of (Sb2o3) thin films using thermal evaporation in vacuum, procedure with different thickness  (100 ,150 ,200 ,and 250) nm, by using ( hot plate) from Molybdenum matter at temperature in ( 9000c) and the period of time (15mint) ,the prepared in a manner thermal evaporation in a vacuum and precipitated on glass bases, pure Antimony Trioxide (sb2o3 ) thin films with various condition have been successfully deposited by (T.E.V) on glass slide substrates. The substrates temperature of about 100oC and the vacuum of about 10-6 torr, to investigated oxidation of evaporated, measure spectra for prepared films in arrange of wavelength (250 – 1100 nm). The following optical properties have been calculated: the absorption coefficient, the forbidden (Eg) for direct and indirect transitions "absorbance, refractive index,  extinction coefficient, real and imaginary parts" of the dielectric constant.


1988 ◽  
Vol 128 ◽  
Author(s):  
G. A. Al-Jumaily ◽  
T. A. Mooney ◽  
W. A. Spurgeon ◽  
H. M. Dauplaise

ABSTRACTOptical thin films of nitrides, oxynitrides and oxides of aluminum and silicon were deposited using ion assisted deposition. Coatings were deposited by thermal evaporation of AlN and e-beam evaporation of Si with simultaneous bombardment with 300 eV ions of nitrogen, a mixture of nitrogen and oxygen or oxygen. The chemical composition and the index of refraction of the coating was varied by varying the gas mixture in the ion beam. Optical properties of and environmental stability of coatings were examined. Results indicated that coatings are stable even under severe conditions of humidity and temperature.


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