Measurement of Mechanical Properties of Thin Films Using a Combination of the Bulge Test and Nanoindentation

2012 ◽  
Vol 36 (2) ◽  
pp. 117-123
Author(s):  
Bong-Bu Jung ◽  
Hun-Kee Lee ◽  
Hyun-Chul Park
Keyword(s):  
Thin Films ◽  
Mechanical Properties ◽  
Bulge Test

Methods to improve reliability of bulge test technique to extract mechanical properties of thin films

2010 ◽  
Vol 50 (9-11) ◽  
pp. 1888-1893 ◽  
Author(s):  
H. Youssef ◽  
A. Ferrand ◽  
P. Calmon ◽  
P. Pons ◽  
R. Plana
Keyword(s):  
Thin Films ◽  
Mechanical Properties ◽  
Bulge Test ◽  
Test Technique ◽  
Improve Reliability

Investigation of the Mechanical Properties of Thin Films by Bulge Test

2009 ◽  
Vol 156-158 ◽  
pp. 477-482
Author(s):  
Audrey Hémel ◽  
Alain Jacques ◽  
Thomas Schenk ◽  
Tomáš Kruml
Keyword(s):  
Thin Films ◽  
Mechanical Properties ◽  
Room Temperature ◽  
Mechanical Tests ◽  
Bulge Test ◽  
Gold Films ◽  
Test Device

A new bulge test device has been built, with the aim to perform mechanical tests on membranes with a thickness in the 100 nm to 10 µm range, between room temperature and 900°C. The first tests on Si3N4 and gold films give results consistent with literature data.

Analysis of the accuracy of the bulge test in determining the mechanical properties of thin films

1992 ◽  
Vol 7 (6) ◽  
pp. 1553-1563 ◽  
Author(s):  
Martha K. Small ◽  
W.D. Nix
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Mechanical Properties ◽  
Finite Element ◽  
Material Properties ◽  
Deformation Behavior ◽  
Initial Conditions ◽  
Standard Technique ◽  
Bulge Test ◽  
The Finite Element Method

Since its first application to thin films in the 1950's the bulge test has become a standard technique for measuring thin film mechanical properties. While the apparatus required for the test is simple, interpretation of the data is not. Failure to recognize this fact has led to inconsistencies in the reported values of properties obtained using the bulge test. For this reason we have used the finite element method to model the deformation behavior of a thin film in a bulge test for a variety of initial conditions and material properties. In this paper we will review several of the existing models for describing the deformation behavior of a circular thin film in a bulge test, and then analyze these models in light of the finite element results. The product of this work is a set of equations and procedures for analyzing bulge test data that will improve the accuracy and reliability of this technique.

Accuracy analysis of plane-strain bulge test for determining mechanical properties of thin films

2014 ◽  
Vol 24 (10) ◽  
pp. 3265-3273 ◽  
Author(s):  
Lin YANG ◽  
Shi-guo LONG ◽  
Zeng-sheng MA ◽  
Zi-han WANG
Keyword(s):  
Thin Films ◽  
Mechanical Properties ◽  
Plane Strain ◽  
Bulge Test ◽  
Accuracy Analysis

scholarly journals Investigation of mechanical properties of gold thin films using a bulge test technique

2010 ◽  
Vol 240 ◽  
pp. 012163 ◽  
Author(s):  
A Hémel ◽  
A Jacques ◽  
T Schenk ◽  
O Ferry ◽  
T Kruml
Keyword(s):  
Thin Films ◽  
Mechanical Properties ◽  
Bulge Test ◽  
Test Technique ◽  
Gold Thin Films

Mechanical testing and microstructural characterisation of TiN thin films

1997 ◽  
Vol 505 ◽  
Author(s):  
A. Karimi ◽  
O. R. Shojaei ◽  
J. L. Martin
Keyword(s):  
Thin Films ◽  
Mechanical Properties ◽  
Residual Stress ◽  
Silicon Nitride ◽  
Titanium Nitride ◽  
Young’S Modulus ◽  
Young's Modulus ◽  
Bulge Test ◽  
Tin Films ◽  
Deposition Parameters

ABSTRACTMechanical properties of titanium nitride (TiNx) thin films have been investigated using the bulge test and the depth sensing nanoindentation measurements. The bulge test was performed on the square free standing membranes made by means of standard micromachining of silicon wafers, while the nanoindentation was conducted on the films adhered to their supporting substrate. Thin layeres of titanium nitride (t = 300 – 1000 nm) were deposited in a r. f. magnetron sputtering system on the Si(100) wafers containing a layer of low stress LPCVD silicon nitride (SiNy). The bulge test was first conducted on the silicon nitride film to determine its proper residual stress and Young's modulus. Then, the composite membrane made of TiNx together with underlying silicon nitride was bulged and the related load-displacement variation was measured. Finally, using a simple rule of mixture formula the elastic mechanical properties of TiNx coatings were calculated. Both the Young's modulus and residual stress showed increasing values with negative bias voltage and nitrogen to titanium ratio, but the substrate temperature between 50–570°C was found less significant as compared to the other parameters. Nanoindentation data extracted from dynamically loading-unloading of TiN films converged to the bulge test measurements for compact coatings, but diverged from the bulge test data for porous coatings. Scanning electron microscopy observation of the cross sectioned specimens showed that TiN films first grow by formation of the nanocrystallites of size mostly between 10 – 15 nm. These nanocrystallites give rise to the columnar morphology beyond a thickness of 50–100 nm. The columns change their aspect with deposition parameters, but remain nearly perpendicular to the film surface. Relationship between microstructural evolution of columns and mechanical properties of coatings are discussed in terms of deposition parameters.

Mechanical properties measurement of silicon nitride thin films using the bulge test

2007 ◽  
Author(s):  
Hun Kee Lee ◽  
Seong Hyun Ko ◽  
Jun Soo Han ◽  
HyunChul Park
Keyword(s):  
Thin Films ◽  
Mechanical Properties ◽  
Silicon Nitride ◽  
Bulge Test

Measurement of Elastic Modulus and Residual Stress of Diamond Thin Films

2007 ◽  
Vol 329 ◽  
pp. 545-550 ◽  
Author(s):  
Dao Hui Xiang ◽  
Ming Chen ◽  
Y.P. Ma ◽  
Fang Hong Sun
Keyword(s):  
Thin Films ◽  
Mechanical Properties ◽  
Residual Stress ◽  
Elastic Modulus ◽  
Young’S Modulus ◽  
Diamond Film ◽  
Young's Modulus ◽  
Effective Means ◽  
Bulge Test ◽  
Diamond Thin Films

Despite great advancements in diamond thin film growth and deposition techniques, determination of the residual stress and Young’s modulus for diamond films has continued to be a challenge. The bulge test is a potentially powerful tool for characterizing the mechanical properties of diamond film. In a bulge tester, pressure is applied on a thin membrane and the out-of-plane deflection of the membrane center is measured. The Young’s Modulus and the residual stress are simultaneously determined by using the load-deflection behavior of a membrane. By means of electron-enhanced hot filament chemical vapor deposition (HFCVD), a diamond film was deposited on silicon slice (100), and the free-standing window sample of diamond thin films was fabricated by means of photolithography and anisotropic wet etching. The deflection of the membranes is measured using a laser interferometry system. The elastic modulus and residual stress were measured using a self-designed bulge equipment. In addition, the distortion of diamond thin films under different pressure was simulated using finite element analysis and the contrast was made with experimental data. The research indicated that the Young’s Modulus of diamond thin films is 937.8GPa and the residual stress is -10.53MPa. The elastic modulus and the residual stress coincide with the report in the literature and the value tested by X-ray diffraction, respectively. This method uses a simple apparatus, and the fabrication of samples is very easy, and it has provided an effective means for precise measure the mechanical properties of other thin films.

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