Improved Long-Term Stability of Low-Temperature Polysilicon Thin-Film Transistors by Using a Tandem Gate Insulator with an Atomic Layer of Deposited Silicon Dioxide

2020 ◽  
Vol 77 (4) ◽  
pp. 277-281
Author(s):  
Sungsoo Lee ◽  
Jin-Seong Park ◽  
Yongtaek Hong
RSC Advances ◽  
2018 ◽  
Vol 8 (37) ◽  
pp. 20990-20995 ◽  
Author(s):  
Xiang Yang ◽  
Shu Jiang ◽  
Jun Li ◽  
Jian-Hua Zhang ◽  
Xi-Feng Li

In this paper, W-doped ZnSnO (WZTO) thin films and TFT devices are successfully fabricated by a wet-solution technique.


2015 ◽  
Vol 26 ◽  
pp. 340-344 ◽  
Author(s):  
Ute Zschieschang ◽  
Konstantin Amsharov ◽  
Martin Jansen ◽  
Klaus Kern ◽  
Hagen Klauk ◽  
...  

2005 ◽  
Vol 252 (5) ◽  
pp. 1332-1338 ◽  
Author(s):  
Woo Jin Kim ◽  
Won Hoe Koo ◽  
Sung Jin Jo ◽  
Chang Su Kim ◽  
Hong Koo Baik ◽  
...  

2009 ◽  
Vol 10 (3) ◽  
pp. 506-510 ◽  
Author(s):  
Kyoseung Sim ◽  
Youngill Choi ◽  
Hyojoong Kim ◽  
Sungwoo Cho ◽  
Sung Cheol Yoon ◽  
...  

AIP Advances ◽  
2017 ◽  
Vol 7 (6) ◽  
pp. 065120 ◽  
Author(s):  
Hiroshi Tsuji ◽  
Tatsuya Takei ◽  
Mitsuru Nakata ◽  
Masashi Miyakawa ◽  
Yoshihide Fujisaki ◽  
...  

2007 ◽  
Vol 124-126 ◽  
pp. 247-250 ◽  
Author(s):  
Won Jun Lee ◽  
Min Ho Chun ◽  
Kwang Su Cheong ◽  
Kwang Chol Park ◽  
Chong Ook Park ◽  
...  

SiO2 films were prepared by atomic layer deposition (ALD) technique, and their physical and electrical properties were characterized for being applied as a gate insulator of low-temperature polysilicon thin-film transistors. ALD SiO2 films were deposited at 350–400 oC using alternating exposures of SiH2Cl2 and O3/O2, and the characteristics of the deposited films were improved with increasing deposition temperature. The ALD films deposited at 400 oC exhibited integrity, surface roughness and leakage current better than those of the conventional plasma-enhanced chemical vapor deposition (PECVD) films.


2020 ◽  
Vol 8 (39) ◽  
pp. 20658-20665 ◽  
Author(s):  
Jae Yu Cho ◽  
SeongYeon Kim ◽  
Raju Nandi ◽  
Junsung Jang ◽  
Hee-Sun Yun ◽  
...  

The highest efficiency of 4.225% for vapor-transport-deposited SnS absorber/CdS heterojunction solar cells with good long-term stability over two years is achieved.


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