Improved Long-Term Stability of Low-Temperature Polysilicon Thin-Film Transistors by Using a Tandem Gate Insulator with an Atomic Layer of Deposited Silicon Dioxide
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2007 ◽
pp. 247-250
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2005 ◽
Vol 252
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pp. 1332-1338
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2012 ◽
Vol 18
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pp. 1055-1060
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2007 ◽
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pp. 247-250
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2020 ◽
Vol 8
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pp. 20658-20665
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