High-Speed X-Ray Projection Microscopy at Beamline 9D of the Pohang Light Source-II

2020 ◽  
Vol 77 (9) ◽  
pp. 802-805
Author(s):  
Kyungjin Park ◽  
Seob-Gu Kim ◽  
Ye Ji Lee ◽  
Jae-Hong Lim ◽  
Jong Hyun Kim
Keyword(s):  
Light Source ◽  
High Speed ◽  
X Ray ◽  
Pohang Light Source ◽  
Ray Projection

scholarly journals Fabrication of PMMA X-ray Compound Refractive Lenses for the Pohang Light Source and Performance Tests

2007 ◽  
Vol 51 (4) ◽  
pp. 1256 ◽  
Author(s):  
Guk Bae Kim ◽  
Sang Joon Lee ◽  
Jin Pyung Lee ◽  
Jong Hyun Kim ◽  
Suk Sang Chang ◽  
...  
Keyword(s):  
Light Source ◽  
Performance Tests ◽  
X Ray ◽  
Pohang Light Source ◽  
And Performance

Note: Construction of x-ray scattering and x-ray absorption fine structure beamline at the Pohang Light Source

2010 ◽  
Vol 81 (2) ◽  
pp. 026103 ◽  
Author(s):  
Ik-Jae Lee ◽  
Chung-Jong Yu ◽  
Young-Duck Yun ◽  
Chae-Soon Lee ◽  
In Deuk Seo ◽  
...  
Keyword(s):  
Fine Structure ◽  
Light Source ◽  
X Ray ◽  
Absorption Fine ◽  
X Ray Scattering ◽  
Pohang Light Source ◽  
X Ray Absorption ◽  
Ray Scattering

A scanning transmission X-ray microscope at the Pohang Light Source

2018 ◽  
Vol 25 (3) ◽  
pp. 878-884 ◽  
Author(s):  
Hyun-Joon Shin ◽  
Namdong Kim ◽  
Hee-Seob Kim ◽  
Wol-Woo Lee ◽  
Chae-Soon Lee ◽  
...  
Keyword(s):  
Energy Range ◽  
Light Source ◽  
Photon Energy ◽  
Chemical State ◽  
Photon Energy Range ◽  
X Rays ◽  
X Ray ◽  
Space Resolution ◽  
Scanning Transmission ◽  
Pohang Light Source

A scanning transmission X-ray microscope is operational at the 10A beamline at the Pohang Light Source. The 10A beamline provides soft X-rays in the photon energy range 100–2000 eV using an elliptically polarized undulator. The practically usable photon energy range of the scanning transmission X-ray microscopy (STXM) setup is from ∼150 to ∼1600 eV. With a zone plate of 25 nm outermost zone width, the diffraction-limited space resolution, ∼30 nm, is achieved in the photon energy range up to ∼850 eV. In transmission mode for thin samples, STXM provides the element, chemical state and magnetic moment specific distributions, based on absorption spectroscopy. A soft X-ray fluorescence measurement setup has been implemented in order to provide the elemental distribution of thicker samples as well as chemical state information with a space resolution of ∼50 nm. A ptychography setup has been implemented in order to improve the space resolution down to 10 nm. Hardware setups and application activities of the STXM are presented.

Upgrade of BL-5C as a highly automated macromolecular crystallography beamline at Pohang Light Source II

2021 ◽  
Vol 28 (2) ◽  
pp. 602-608
Author(s):  
Jae-Hee Jeong ◽  
Cheolsoo Eo ◽  
Hyo-Yun Kim ◽  
Jin-Hong Kim ◽  
Chae-Soon Lee ◽  
...  
Keyword(s):  
Light Source ◽  
Photon Counting ◽  
High Capacity ◽  
Spot Size ◽  
Data Sets ◽  
Macromolecular Crystallography ◽  
X Ray ◽  
Photon Counting Detector ◽  
Fragment Screening ◽  
Pohang Light Source

BL-5C is an in-vacuum undulator beamline dedicated to macromolecular crystallography (MX) at the 3 GeV Pohang Light Source II in Korea. The beamline delivers X-ray beams with a focal spot size of 200 µm × 40 µm (FWHM, H × V) over the energy range 6.5–16.5 keV. The measured flux is 7 × 1011 photons s−1 at 12.659 keV through an aperture size of 50 µm. The experimental station is newly equipped with the photon-counting detector EIGER 9M, the multi-axis micro-diffractometer MD2, and a robotic sample changer with a high-capacity dewar. These instruments enable the operation of this beamline as an automated MX beamline specialized in X-ray fragment screening. This beamline can collect more than 400 data sets a day without human intervention, and a difference map can be automatically calculated by using the data processing pipeline for ligand or fragment identification.

Prototype high-speed tape target transport for a laser plasma soft-x-ray projection lithography source

1993 ◽  
Vol 32 (34) ◽  
pp. 6934 ◽  
Author(s):  
Steven J. Haney ◽  
Kurt W. Berger ◽  
Glenn D. Kubiak ◽  
Paul D. Rockett ◽  
John Hunter
Keyword(s):  
Laser Plasma ◽  
High Speed ◽  
X Ray ◽  
Projection Lithography ◽  
Ray Projection

Coherent X-ray scattering beamline at port 9C of Pohang Light Source II

2013 ◽  
Vol 21 (1) ◽  
pp. 264-267 ◽  
Author(s):  
Chung-Jong Yu ◽  
Hae Cheol Lee ◽  
Chan Kim ◽  
Wonsuk Cha ◽  
Jerome Carnis ◽  
...  
Keyword(s):  
Light Source ◽  
Correlation Spectroscopy ◽  
X Rays ◽  
Photon Correlation ◽  
X Ray ◽  
Coherent Diffraction Imaging ◽  
X Ray Scattering ◽  
Pohang Light Source ◽  
Diffraction Imaging ◽  
Ray Scattering

The coherent X-ray scattering beamline at the 9C port of the upgraded Pohang Light Source (PLS-II) at Pohang Accelerator Laboratory in Korea is introduced. This beamline provides X-rays of 5–20 keV, and targets coherent X-ray experiments such as coherent diffraction imaging and X-ray photon correlation spectroscopy. The main parameters of the beamline are summarized, and some preliminary experimental results are described.

THE APPLICATION OF SCANNING PHOTOELECTRON MICROSCOPY OF THE PLS (POHANG LIGHT SOURCE) TO INVESTIGATION OF SEMICONDUCTOR DEVICES

2002 ◽  
Vol 09 (01) ◽  
pp. 497-501 ◽  
Author(s):  
M. K. LEE ◽  
H. J. SHIN ◽  
G. B. KIM ◽  
C. K. HONG ◽  
O. H. KIM ◽  
...  
Keyword(s):  
Light Source ◽  
Photoelectron Spectroscopy ◽  
Line Shift ◽  
Sensor Chip ◽  
Conducting Layer ◽  
Si Substrate ◽  
X Ray ◽  
Semiconductor Sensor ◽  
Pohang Light Source ◽  
Scanning Photoelectron Microscopy

Scanning photoelectron microscopy (SPEM) was used to investigate a semiconductor sensor chip and Cu patterns embedded in Si substrate. It was found that the line shift in X-ray photoelectron spectroscopy (XPS) caused by local charges on the passivated surface is proportional to the distance between the surface and the conducting layer of the sensor chip. By using the line shift in XPS, inner-layered microstructure of the sensor chip could be imaged without destroying the sample. The result for the Cu patterns indicates that the surface of Cu patterns is more contaminated with carbon in the air than the surface of the Si pattern.

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