Electrical and Structural Properties of TiO2 Thin Film Prepared at Different Annealing Temperatures by Sol-Gel Spin-Coating Method

2013 ◽  
Vol 667 ◽  
pp. 371-374 ◽  
Author(s):  
M. Basri ◽  
Mohd Nor Asiah ◽  
Mohd Khairul bin Ahmad ◽  
Mohamad Hafiz Mamat ◽  
Mohamad Rusop Mahmood

Titanium Dioxide (TiO2) thin films have been prepared on glass substrates by using sol-gel method and spin-coating technique. The samples have been annealed at temperatures of 350°C ~ 500oC. The electrical and structural properties of the thin films due to the changes of annealing treatment process were investigated by 2 point probes I-V measurement and X-ray Diffraction (XRD) respectively. The result show that resistivity of the thin film decreased with annealing temperatures. XRD characterization indicates crystalline structure of TiO2 thin films improved as annealed at higher temperatures.

2010 ◽  
Vol 09 (04) ◽  
pp. 355-358 ◽  
Author(s):  
T. S. SENTHIL ◽  
M. THAMBIDURAI ◽  
N. MUTHUKUMARASAMY ◽  
R. BALASUNDARAPRABHU

TiO2 thin films have been deposited onto well cleaned glass substrates by sol–gel spin coating method. The prepared TiO2 films have been annealed at different temperatures (350°C, 450°C and 550°C). The structural properties of the films have been studied using X-ray diffraction method and High Resolution Transmission Electron Microscope (HRTEM). The as-deposited films have been found to be amorphous in nature. The crystalline quality has been observed to improve with annealing temperature. The annealed TiO2 films have been found to exhibit anatase phase. The optical properties have been studied using transmittance spectrum.


2013 ◽  
Vol 667 ◽  
pp. 24-29
Author(s):  
Mohamad Hafiz Mamat ◽  
A.A.A. Halim ◽  
Mohd Zainizan Sahdan ◽  
S. Amizam ◽  
Zuraida Khusaimi ◽  
...  

The effect of annealing temperatures on the Zinc Oxide (ZnO) thin films properties has been investigated. 1.0 M ZnO solution was prepared by sol-gel method as coating solution for ZnO thin films deposition process. The thin films deposition was conducted by spin-coating technique on the silicon and glass substrates. The scanning electron microscopy (SEM) images reveal the evolution of ZnO surface morphology with annealing temperatures. The crystallinity improvement occurred at higher annealing temperature as shown by x-ray diffraction (XRD) result. The optical properties found to be varied at different annealing temperatures. The current-voltage (I-V) measurement results suggested the improvement of ZnO thin film electrical properties with annealing temperatures.


2013 ◽  
Vol 16 (1) ◽  
pp. 92-100
Author(s):  
Chien Mau Dang ◽  
Dam Duy Le ◽  
Tam Thi Thanh Nguyen ◽  
Dung Thi My Dang

In this study, we have successfully synthesized Fe3+ doped SiO2/TiO2 thin films on glass substrates using the sol-gel dip-coating method. After synthesizing, the samples were annealed at 5000C in the air for 1 hour. The characteristics and optical properties of Fe3+ doped SiO2/TiO2 films were then investigated by X-ray diffraction (XRD), ultraviolet-visible spectroscopy (UV-vis) and Fourier transform infrared spectroscopy (FT-IR). An antifogging ability of the glass substrates coated with the fabricated film is investigated and explained by a water contact angle under visible-light. The analyzed results also show that the crystalline phase of TiO2 thin films comprised only the anatase TiO2, but the crystalline size decreased from 8.8 to 5.9 nm. We also observed that the absorption edge of Fe3+- doped SiO2/TiO2 thin films shifted towards longer wavelengths (i.e. red shifted) from 371.7nm to 409.2 nm when the Fe3+-doped concentration increased from 0 to 1 % mol.


2021 ◽  
Vol 63 (8) ◽  
pp. 778-782
Author(s):  
Tülay Yıldız ◽  
Nida Katı ◽  
Kadriye Yalçın

Abstract In this study, undoped semiconductor ZnO thin film and Bi-doped ZnO thin films were produced using the sol-gel spin coating method. By changing each parameter of the spin coating method, the best conditions for the formation of the film were determined via the trial and error method. When the appropriate parameter was found, the specified parameter was applied for each film. The structural, superficial, and optical properties of the films produced were characterized via atomic force microscope (AFM), UV-visible spectroscopy, and Fourier transform infrared (FTIR), and the effects of Bi dopant on these properties were investigated. When the morphological properties of the undoped and Bi-doped ZnO films were examined, it was observed that they had a structure in a micro-fiber shape consisting of nanoparticles. When the surface roughness was examined, it was observed that the surface roughness values became larger as the rate of Bi dopant increased. By examining the optical properties of the films, it was determined that they were direct band transition materials and Bi-doped thin films were involved in the semiconductor range. In addition, optical properties changed positively with Bi dopant. Since Bi-doped ZnO thin film has a wide bandgap and good optical properties, it is a material that can be used in optoelectronic applications.


2011 ◽  
Vol 312-315 ◽  
pp. 1027-1031
Author(s):  
Mohd Noor Asiah ◽  
Mat Zain Basri ◽  
Mohamad Rusop

This paper investigated the electrical properties of nanostructured Titanium Dioxide (TiO2) thin films prepared by the sol-gel method at different annealing temperatures. The precursor used was Titanium (IV) butoxide at concentration of 0.4 M. The TiO2 thin films were deposited on the glass and silicon substrates by using the spin coating technique. The influence of annealing temperatures on the electrical, structural, surface morphology and optical properties of the films were characterized by I-V measurement, X-Ray Diffraction (XRD), Scanning Electron Microscopy (SEM) and UV-Vis Spectroscopy, respectively. It was found that the electrical properties of TiO2¬ thin films were changed due to the changes of annealing temperatures. As the annealing temperatures rises, the resistivity of the film found to be decreased. The result also shows that films which does not applied annealing temperature called as deposited were found to be amorphous while the films with annealing temperature T = 350oC and above became crystalline structure. The anatase phase can be obtained at annealing temperatures from T = 350oC up to T = 500oC.


2011 ◽  
Vol 36 (6) ◽  
pp. 4130-4133 ◽  
Author(s):  
A. Elfanaoui ◽  
E. Elhamri ◽  
L. Boulkaddat ◽  
A. Ihlal ◽  
K. Bouabid ◽  
...  

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