Magnetic and Transport Properties of Mn-Si Films Synthesized on 4H-SiC(0001) Substrates

2007 ◽  
Vol 546-549 ◽  
pp. 2167-2170 ◽  
Author(s):  
Wen Hong Wang ◽  
Fumi Yoshi Takano ◽  
Hiro Nori Ofuchi ◽  
Hiro Akinaga

We report a systematic study of the thickness dependence of magnetic properties in carbon-incorporated Mn-Si films synthesized on a 4H-SiC(0001) homoepitaxial wafer by molecular beam epitaxy (MBE) and an annealing method. Magnetization characteristics reveal a dual-phase characteristic in films with decreasing thickness. The anomalous Hall effect has been observed in the thicker film; however, the observed temperature dependence cannot be explained by traditional anomalous Hall effect theory. The temperature dependent resisitivity indicates the film has a metallic behavior.

2008 ◽  
Vol 10 (11) ◽  
pp. 115002 ◽  
Author(s):  
Yoon Shon ◽  
Sejoon Lee ◽  
D Y Kim ◽  
T W Kang ◽  
Chong S Yoon ◽  
...  

2017 ◽  
Vol 254 ◽  
pp. 48-51 ◽  
Author(s):  
K.K. Meng ◽  
J. Miao ◽  
X.G. Xu ◽  
Y. Wu ◽  
J.H. Zhao ◽  
...  

2000 ◽  
Vol 648 ◽  
Author(s):  
B. Schirmer ◽  
X. Liu ◽  
M. Wuttig

AbstractUltrathin iron films grown on Cu(100) have been found to exhibit a rich variety of structural and magnetic phases. In the present work, Fe/Ni bilayers have been prepared by molecular beam epitaxy to explore novel magnetic phenomena introduced by the ferromagnetic (FM) Ni underlayer. Unusual properties have been observed by measuring the temperature dependent magnetic properties. For 5.3 ML Fe on 7 ML Ni, a temperature dependent exchange coupling in the Fe film has been observed between the FM surface layer and FM interface layer.


2020 ◽  
pp. 412692
Author(s):  
Zhongping Zhao ◽  
Qi Guo ◽  
Fenghua Chen ◽  
Kewei Zhang ◽  
Yong Jiang

2000 ◽  
Vol 87 (9) ◽  
pp. 5576-5578 ◽  
Author(s):  
Yeongkuo Lin ◽  
Dean J. Miller ◽  
J. S. Jiang ◽  
John Pearson ◽  
S. D. Bader

1985 ◽  
Vol 46 ◽  
Author(s):  
L.T. Parechanian ◽  
E.R. Weber ◽  
T.L. Hierl

AbstractThe simultaneous molecular beam epitaxy (MBE) growth of (100) and (110) GaAs/GaAsintentionally doped with Si(∼lE16/cm^3) was studied as a function of substrate temperature, arsenic overpressure, and epitaxial growth rate. The films wereanalyzed by scanning electron and optical microscopy, liquid helium photoluminescence (PL), and electronic characterization.For the (110) epitaxal layers, an increase in morphological defect density and degradation of PL signal was observed with a lowering of the substrate temperature from 570C. Capacitance-voltage (CV) and Hall Effect measurements yield room temperature donor concentrations for the (100) films of n∼l5/cm^3 while the (110) layers exhibit electron concentrations of n∼2El7/cm^3. Hall measurements at 77K on the (100) films show the expected mobility enhancement of Si donors, whereas the (110) epi layers become insulating or greatly compensated. This behavior suggests that room temperature conduction in the (110) films is due to a deeper donor partially compensated by an acceptor level whose concentration is of the same order of magnitude as that of any electrically active Si. Temperature dependent Hall effect indicates that the activation energy of the deeper donor level lies ∼290 meV from the conduction band. PL and Hall effect indicate that the better quality (110) material is grown by increasingthe arsenic flux during MBE growth. The nature of the defects involved with the growth process will be discussed.


2018 ◽  
Vol 20 (35) ◽  
pp. 22652-22659 ◽  
Author(s):  
F. Crasto de Lima ◽  
Gerson J. Ferreira ◽  
R. H. Miwa

Charge transfer between metal–organic Kagome lattices interfaced with graphene provides a tunable quantum anomalous Hall effect.


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