One-Step Anodization Preparation and Photoluminescence Property of Anodic Aluminum Oxide with Nanopore Arrays

2010 ◽  
Vol 663-665 ◽  
pp. 272-275
Author(s):  
Wen Bin Yang ◽  
Xiao Hong Tang

Anodic aluminum oxide (AAO) film with nanopore arrays was prepared by one-step anodization of highly pure aluminum foil. Morphology, structure and photoluminescence property of AAO were characterized. Results showed that AAO owned honeycomb structure which was characterized by close-packed arrays of columnar hexagonal cells, each containing a central pore normal to the substrate. There were three peaks at around 370, 385 and 470 nm in the PL spectrum of AAO, which should be mainly attributed to the oxygen vacancies.

2013 ◽  
Vol 724-725 ◽  
pp. 63-66
Author(s):  
Guo Feng Ma ◽  
Hong Ling Zhang ◽  
Hong Bo Fu ◽  
Li Na Sun ◽  
Chun Lin He

The anodic aluminum oxide (AAO) templates on polycrystalline silicon substrate are studied for growth of ordered nano-dot arrays in order to fabricate the porous silicon layers. The AAO templates on polycrystalline silicon substrate with pores of average diameter 50nm were successfully prepared by one-step anodization of high pure aluminum layer deposited on polycrystalline silicon in oxalic acid solution. Scanning electron microscopy (SEM) showed that alumina nano-pore arrays were nicely constructed with smooth wall morphologies and well-defined diameters.


2012 ◽  
Vol 549 ◽  
pp. 358-361
Author(s):  
Xiao Hong Tang ◽  
Wen Bin Yang ◽  
Ya Fei Cheng ◽  
Quan Guo Huang

Anodic alumina membranes (AAM) with nanopore arrays were prepared by one-step anodization of highly pure aluminum foil. Morphology, structure and composition of AAM were characterized by scanning electron microscopy (SEM), energy dispersion spectroscopy (EDS), X-ray photoelectron spectroscopy (XPS) and X-ray diffraction (XRD). Results showed that AAM owned honeycomb structure which was characterized by close-packed arrays of columnar hexagonal cells, each containing a central pore normal to the substrate. The diameter of pores and the size of cells changed under different anodic conditions, such as temperature, concentration of H2C2O4 solution, voltage and time of anodization. The walls of AAM were composed of two strains of nanoparticles of alumina. Furthermore, the chemical composition of AAM was found to be amorphous alumina. The prepared AAM with nanopore arrays is a kind of ideal template for preparation of many one-dimensional nanomaterials.


2014 ◽  
Vol 809-810 ◽  
pp. 627-630
Author(s):  
Kai Feng Zhang ◽  
Hui Zhou ◽  
Hu Lin Li ◽  
Rui Peng Sang ◽  
Zhi Hua Wan ◽  
...  

A new and facile method for improving the procedure of anodic aluminum oxide (AAO) film preparation was presented, which was based on an electrochemical detachment procedure. The detachment and pore-opening were performed just through one step in a solution of HClO4and C2H5OH at a voltage of 40V. The as-obtained AAO film was characterized by scanning electron microscopy (SEM) and scanning probing microscopy (SPM). The process of detachment and pore-opening was also discussed.


2005 ◽  
Vol 900 ◽  
Author(s):  
Aijun Yin ◽  
Jimmy Xu

ABSTRACTIn this work, we report a success in fabricating highly-ordered and densely-packed array of silicon nano-needles that are vertically aligned, straight and long, meeting many of the requirements for biomolecular sensing and integration with silicon electronics. Yet, we show that they can be fabricated with a relatively simple and non-lithographic method.In this approach the array of nano-needles of high uniformity in length and diameter are made out of silicon by reactive ion etching (RIE) through either an anodic aluminum oxide (AAO) membrane or an array of metallic nano-dot caps that are evaporated on a silicon wafer using an AAO membrane as mask. The AAO membrane itself is formed non-lithographically via anodization of pure aluminum foil and contains an array of highly-ordered and highly-uniform nano-pores. By using the AAO membrane either directly as an etching mask or as an evaporation mask to deposit metallic nanodots which in turn serve as an etching mask, deep and high aspect-ratio etching is possible to allow the formation of the nanoneedles in a Si substrate.


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