Thin Film Capacitor Applications in RF/Microwave Circuits

2017 ◽  
Vol 2017 (1) ◽  
pp. 000056-000060
Author(s):  
William B. Kuhn ◽  
J. Ambrose Wolf

Abstract Thin-film capacitors can be created on various substrates including glass, low-temperature co-fired ceramic (LTCC), and potentially on laminate PC board materials if the surface is sufficiently smooth. This paper looks at the circuit-design issues of how such a technology could be used in high-speed digital and microwave circuits for improving both signal integrity and power integrity (SI/PI). Two primary applications are examined: the formation of a low-inductance power-supply bypass allowing reduced supply ‘noise’, and the formation of AC coupling (DC blocking) circuits with improved signal return-loss.

Author(s):  
Masamitsu Yoshizawa ◽  
Seisei Oyamada ◽  
Atsunori Hattori ◽  
Toru Nakura ◽  
Kunihiro Asada

Author(s):  
Masamitsu Yoshizawa ◽  
Seisei Oyamada ◽  
Atsunori Hattori ◽  
Toru Nakura ◽  
Masahiro Kano ◽  
...  

2018 ◽  
Vol 2018 (1) ◽  
pp. 000180-000185
Author(s):  
Tony Tang ◽  
Bridger Wray ◽  
Rajen Murugan

Abstract In this paper we detail the system (viz. silicon-package-pcb) electrical co-design of a 130nm BiCMOS high-speed (25Gbps) 4-channel multi-rate retimer, packaged in a small 6-mm × 6-mm FC BGA package, with integrated advanced signal conditioning circuitries. Electrical optimization of the silicon-package-pcb over the high speed channels, to achieve desired performance, was achieved through a coupled circuit-to-electromagnetic co-design modeling and simulation methodology. Key figure of merits for system electrical performance (viz. insertion loss, return loss, crosstalk/isolation, jitter, and power supply inductance and resistance parasitics, among others) are modeled and analyzed. Laboratory measurements on a retimer are presented that validate the integrity of the modeling methodology. Good correlation between modeling methodology and laboratory measurements is achieved.


2014 ◽  
Vol 2014 (1) ◽  
pp. 000832-000837
Author(s):  
Akhlaq Rahman ◽  
Fred Olinger ◽  
Michael Howieson

Ever-rising pressure of improving frequency domain performance of RF and Microwave components to improve the signal integrity as well as to reduce component package size consistently challenge design engineers not only with signal integrity and size constraints, but also the power integrity and thermal constraints concurrently. To achieve excellent signal and power integrity performance for microwave frequency application, components need to have superior voltage standing wave ratio (VSWR) characteristics as well as outstanding power handling capability. Addition to the brilliant component performance, manufacturers need to achieve excellent fabrication yield performance to keep the project viable. Process engineers face many challenges on each fabrication steps, which could significantly degrade the fabrication yield. Few challenges could originate from material sets, while others could arise from the process variations. In this work, we extensively studied the influence of many different parameters that considerably diminish the fabrication yield performance. We analyzed different parameters to design RF and Microwave termination resistors using thin film materials. One of the essential parameters, which significantly reduce the fabrication yield, is the inconsistency of surface roughness throughout the wafer. We studied the variations of the thin film materials microstructure and the sensitivity of film resistivity in response to surface roughness inconsistency. We experimented anneal drift of the material and effects of the temperature compensation of resistor (TCR) due to substrate surface roughness and existence of powder contamination on the surface. We compared Lapped and As-Fired substrates roughness and researched the inconsistence roughness effects on the thin film material. We studied the deposition rate of sputtered copper over the life of the target, from machine to machine and across the pallet, and analyzed the effects on the thin film material component. We studied the moisture related long time drift based on electro migration effect and the temperature dependence drift based on the materials sheet resistance. We analyzed the alteration of current density due to thin film resistor trimming and yield loss due to resistor value tolerance and trim variation by studying the sensitivity of the resistor area variation through trimming process. By analyzing different fabrication factors and material parameter properties, we realized the fact that most sensitive parameter that degrades the process yield is the existence of inconsistent surface roughness throughout the substrate. Based on the research study, we developed high power RF and Microwave 50 ohm termination resistors with excellent fabrication process yield performance.


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