Direct measurement of potentials in a reactive ion-plasma etching system
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The Body
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Devices for direct measurement of the plasma potential and floating potential in a gas dis-charge in a reactive ion-plasma etching system are presented. The action of the devices devel-oped for this purpose is based on the creation of a local magnetic field that allows purposeful-ly changing the conditions of ambipolar diffusion of charged particles. This makes it possible to contact the probe with the body of a positive plasma column without the appearance of a floating potential on it. The results of measuring the plasma potential by the proposed and al-ternative methods are compared
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2019 ◽
Vol 16
(6)
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pp. 907-910
1958 ◽
Vol 6
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pp. 446-447
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2007 ◽
Vol 39
(2)
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pp. 211-221
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2015 ◽
Vol 10
(0)
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pp. 3405016-3405016
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