PROPERTIES OF OXYNITRIDE COATINGS ON STEEL OBTAINED BY THREE-STAGE NITRIDING PROCESSES WITH OXIDATION

Metallurg ◽  
2021 ◽  
pp. 64-68
Author(s):  
U.R. Boynazarov ◽  
L.G. Petrova ◽  
A.A. Brezhnev ◽  
P.S. Bibikov
Keyword(s):  
2017 ◽  
Vol 35 (1) ◽  
pp. 254-264
Author(s):  
Joanna Piwowarczyk ◽  
Roman Jędrzejewski ◽  
Jolanta Baranowska

AbstractThe paper presents results of the investigation on the influence of deposition parameters, such as substrate temperature, total gas pressure and reactive gas composition on the structure, chemical composition and mechanical properties of aluminum oxynitride coatings obtained by pulsed laser deposition (PLD) method. Selection of process parameter ranges, which could be promising for aluminum oxynitride (ALON) coatings deposition, was the main objective of the work. Two series of experiments were carried out with varied pressure and temperature. It was found that from the chemical composition viewpoint, the most promising are atmospheres containing 20 % to 40 % oxygen. The nitrogen to oxygen ratios in the coatings can be controlled by increasing the total pressure or substrate temperature. However, increasing the pressure has a negative effect on the O + N:Al ratio, mechanical properties and quality of the coatings. The influence of temperature is much less drastic and more controllable. Increasing the deposition temperature is much more beneficial since it improves the mechanical properties and can compensate to some extent the negative effect of the total pressure. From the coating quality viewpoint, it is possible to establish an optimum temperature range for which the coatings are characterized by a compact structure and a limited number of droplets.


1988 ◽  
Vol 128 ◽  
Author(s):  
G. A. Al-Jumaily ◽  
T. A. Mooney ◽  
W. A. Spurgeon ◽  
H. M. Dauplaise

ABSTRACTOptical thin films of nitrides, oxynitrides and oxides of aluminum and silicon were deposited using ion assisted deposition. Coatings were deposited by thermal evaporation of AlN and e-beam evaporation of Si with simultaneous bombardment with 300 eV ions of nitrogen, a mixture of nitrogen and oxygen or oxygen. The chemical composition and the index of refraction of the coating was varied by varying the gas mixture in the ion beam. Optical properties of and environmental stability of coatings were examined. Results indicated that coatings are stable even under severe conditions of humidity and temperature.


2009 ◽  
Vol 517 (21) ◽  
pp. 5956-5964 ◽  
Author(s):  
A. Rizzo ◽  
M.A. Signore ◽  
L. Mirenghi ◽  
T. Di Luccio

Author(s):  
Oana Cristina Duta ◽  
Denisa Ficai ◽  
Anton Ficai ◽  
Ecaterina Andronescu ◽  
Nataliia Beshchasna ◽  
...  

2021 ◽  
Author(s):  
Sina Malobabic ◽  
Niklas Höpfl ◽  
Sebastian Herr ◽  
Lars Mechold

2015 ◽  
Vol 227 ◽  
pp. 503-506 ◽  
Author(s):  
Oleh Tkachuk ◽  
Roman Proskurnyak ◽  
Iryna Pohrelyuk ◽  
Viktor Fedirko

The influence of temperature change of isotonic 0.9 % NaCl solution and Ringer's solution from 36 оС to 40 оС on the corrosion resistance of Ti-6Al-4V alloy with nitride and oxynitride coatings was studied. It was shown that increase of the temperature of 0.9 % NaCl and Ringer's solutions doesn′t deteriorate the protective function of oxynitride coating on Ti-6Al-4V alloy. It was determined that by increasing the temperature of Ringer's solution the corrosion processes on nitride coating are accelerated, while in 0.9 % NaCl the nitride coating provides the stable characteristics.


2019 ◽  
Vol 27 (03) ◽  
pp. 1950120
Author(s):  
DARJA STEINER PETROVIČ ◽  
ANKA TRAJKOVSKA PETKOSKA ◽  
ILIJA NASOV ◽  
DJORDJE MANDRINO

In this study, a surface-sensitive Auger Electron Spectroscopy (AES) was used to comprehensively characterize titanium-oxynitride coatings on metals for high efficient solar absorbers. Primary information obtained from the AES is chemical composition, but chemical state of the elements may also be estimated. Corroborative information about the coating’s structure was obtained from the estimate of Cu, Al and Ti oxidation state vs depth, also derived from the AES data. Ti/(O [Formula: see text] N) concentration ratios vs depth in TiOXNY layer of the coatings on the Al and Cu substrate were also determined. Physical Vapor Deposition (PVD) was used to prepare TiOXNY multilayered on Al and Cu substrates. Individual layer’s depth was in submicron domain. Deposition procedure and corresponding deposition parameters are presented. Optical properties (emittance, absorptance) of the coatings on both substrate types were also measured to confirm that coatings performed well their intended function (i.e. spectral selectivity).


2014 ◽  
Vol 317 ◽  
pp. 986-993 ◽  
Author(s):  
Oksana Banakh ◽  
Mira Moussa ◽  
Joel Matthey ◽  
Alessandro Pontearso ◽  
Maria Cattani-Lorente ◽  
...  

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