(Sb2S3)1-xSnx thin films with different concentrations (0, 0.05 and0.15) and thicknesses (300,500 and 700nm) have been deposited bysingle source vacuum thermal evaporation onto glass substrates atambient temperature to study the effect of tin content, thickness andon its structural morphology, and electrical properties. AFM studyrevealed that microstructure parameters such as crystallite size, androughness found to depend upon deposition conditions. The DCconductivity of the vacuum evaporated (Sb2S3)1-x Snx thin films wasmeasured in the temperature range (293-473)K and was found toincrease on order of magnitude with increase of thickness, and tincontent. The plot of conductivity with reciprocal temperaturesuggests, there are three activation energies Ea1, Ea2 and Ea3 for(Sb2S3)1-x Snx for all x content values and thicknesses whichdecreases with increasing tin content and thickness. Hall effectmeasurement showed that low thickness (Sb2S3)1-x Snx film exhibitn-type conductance whereas the film exhibit p-type towards thehigher thickness. The electric carrier concentration and mobilityshow opposite dependence upon tin content and thickness.