Low Temperature Chemical Vapour Deposition of Polycrystalline Silicon Carbide Film Using Monomethylsilane Gas
1993 ◽
Vol 2
(10)
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pp. 1330-1335
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2003 ◽
Vol 20
(10)
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pp. 1879-1882
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1996 ◽
Vol 51-52
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pp. 255-260
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1996 ◽
Vol 166
(1-4)
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pp. 628-630
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2001 ◽
Vol 231
(1-2)
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pp. 242-247
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Keyword(s):
Keyword(s):
1997 ◽
Vol 12
(2)
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pp. 224-227
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2010 ◽
Vol 43
(18)
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pp. 185102
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