Activation of As Atoms in Ultrashallow Junction during Milli- and Microsecond Annealing Induced by Thermal-Plasma-Jet Irradiation
2011 ◽
Vol 50
(4S)
◽
pp. 04DA07
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2010 ◽
Vol 49
(4)
◽
pp. 04DA02
◽
High Temperature Material Processes An International Quarterly of High-Technology Plasma Processes
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2004 ◽
Vol 8
(2)
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pp. 215-220
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2005 ◽
Vol 244
(1-4)
◽
pp. 8-11
◽
2018 ◽
Vol 14
(1)
◽
pp. 16-28
◽
2008 ◽
Vol 36
(4)
◽
pp. 1066-1067
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