Room-Temperature Fabrication of HfON Gate Insulator for Low-Voltage-Operating Pentacene-Based Organic Field-Effect Transistors

2012 ◽  
Vol 51 (4S) ◽  
pp. 04DK01 ◽  
Author(s):  
Min Liao ◽  
Hiroshi Ishiwara ◽  
Shun-ichiro Ohmi
RSC Advances ◽  
2016 ◽  
Vol 6 (115) ◽  
pp. 114593-114598 ◽  
Author(s):  
Xue-feng She ◽  
Jingsong Wang ◽  
Qingguo Xue ◽  
Wentao Xu

Raw product of rare-earth ore was found to be good candidate for fabricating high-k gate insulator in field-effect transistors.


2004 ◽  
Vol 33 (9) ◽  
pp. 1172-1173 ◽  
Author(s):  
Heisuke Sakai ◽  
Yukio Furukawa ◽  
Eiichi Fujiwara ◽  
Hirokazu Tada

RSC Advances ◽  
2017 ◽  
Vol 7 (8) ◽  
pp. 4645-4645
Author(s):  
Xue-feng She ◽  
Jingsong Wang ◽  
Qingguo Xue ◽  
Wentao Xu

Correction for ‘Raw product of rare-earth ore works as a high-k gate insulator for low-voltage operable organic field-effect transistors’ by Xue-feng She et al., RSC Adv., 2016, 6, 114593–114598.


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