Interfacial Adhesion Energy of Ru–AlO Thin Film Deposited by Atomic Layer Deposition between Cu and SiO2: Effect of the Composition of Ru–AlO Thin Film
2012 ◽
Vol 51
(5S)
◽
pp. 05EB04
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2012 ◽
Vol 51
◽
pp. 05EB04
◽
Keyword(s):
Keyword(s):
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2016 ◽
Vol 157
◽
pp. 757-764
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2014 ◽
Vol 2
(36)
◽
pp. 15044-15051
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Keyword(s):
2014 ◽
Vol 118
(16)
◽
pp. 8722-8722
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