Dissociation degree of nitrogen molecule in low-pressure microwave-discharge nitrogen plasma with various rare-gas admixtures

2016 ◽  
Vol 55 (8) ◽  
pp. 086101 ◽  
Author(s):  
Kei Kuwano ◽  
Atsushi Nezu ◽  
Haruaki Matsuura ◽  
Hiroshi Akatsuka
Materials ◽  
2020 ◽  
Vol 13 (17) ◽  
pp. 3852
Author(s):  
Bongjun Gu ◽  
Dongwook Ko ◽  
Sungjin Jo ◽  
Dong Choon Hyun ◽  
Hyeon-Ju Oh ◽  
...  

Wrinkles attract significant attention due to their ability to enhance the mechanical and optical characteristics of various optoelectronic devices. We report the effect of the plasma gas type, power, flow rate, and treatment time on the wrinkle features. When an optical adhesive was treated using a low-pressure plasma of oxygen, argon, and nitrogen, the oxygen and argon plasma generated wrinkles with the lowest and highest wavelengths, respectively. The increase in the power of the nitrogen and oxygen plasma increased the wavelengths and heights of the wrinkles; however, the increase in the power of the argon plasma increased the wavelengths and decreased the heights of the wrinkles. Argon molecules are heavier and smaller than nitrogen and oxygen molecules that have similar weights and sizes; moreover, the argon plasma comprises positive ions while the oxygen and nitrogen plasma comprise negative ions. This resulted in differences in the wrinkle features. It was concluded that a combination of different plasma gases could achieve exclusive control over either the wavelength or the height and allow a thorough analysis of the correlation between the wrinkle features and the characteristics of the electronic devices.


1990 ◽  
Vol 67 (1) ◽  
pp. 146-153 ◽  
Author(s):  
D. E. Gerassimou ◽  
S. Cavadias ◽  
D. Mataras ◽  
D. E. Rapakoulias

Author(s):  
Nikolay V Gavrilov ◽  
Alexander S Kamenetskikh ◽  
Petr V Tretnikov ◽  
Sergey V Krivoshapko

2001 ◽  
Vol 27 (1) ◽  
pp. 68-75 ◽  
Author(s):  
A. M. Bystrov ◽  
V. B. Gildenburg

2019 ◽  
Vol 139 ◽  
pp. 62-69 ◽  
Author(s):  
Ravit Farber ◽  
Inbal Dabush-Busheri ◽  
Gilad Chaniel ◽  
Shmuel Rozenfeld ◽  
Edward Bormashenko ◽  
...  

2011 ◽  
Vol 13 (2) ◽  
pp. 208-212 ◽  
Author(s):  
N. U Rehman ◽  
F. U Khan ◽  
S Naseer ◽  
G Murtaza ◽  
S. S Hussain ◽  
...  

1995 ◽  
Vol 2 (7) ◽  
pp. 2853-2862 ◽  
Author(s):  
P. Domingo ◽  
A. Bourdon ◽  
P. Vervisch

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