Thickness Dependent Device Operation of Sublimed Molecular Field-Effect Transistors

2003 ◽  
Author(s):  
S. Hoshino ◽  
M. Yoshida ◽  
S. Uemura ◽  
T. Kodzasa ◽  
T. Kamata ◽  
...  
2008 ◽  
Vol 18 (04) ◽  
pp. 825-840
Author(s):  
TOUHIDUR RAHMAN ◽  
MOHAMMAD A. HUQUE ◽  
SYED K. ISLAM

In this paper, an efficient numerical model applicable for wide varieties of long channel field-effect transistors (MOSFET, MESFET, HEMT, etc.) is developed. A set of available data is used to calculate the model parameters and another set of data is used to verify the accuracy of the model. This model provides a single expression that is applicable for the entire range of device biasing and can predict the output parameters with less than 1% error compared to the experimental results. Lagrange polynomial, the highest degree of polynomial for any given set of data, is used to derive the model from available data. This method is efficient in the sense that it can be derived from a limited number of experimental data and since it uses only one equation for entire range of the device operation hence its computational cost is also small.


2019 ◽  
Vol 29 (36) ◽  
pp. 1903738 ◽  
Author(s):  
Vineeth Kumar Bandari ◽  
Yue Gu ◽  
Subao Shi ◽  
Yang Nan ◽  
Keqiang He ◽  
...  

2011 ◽  
Vol 99 (4) ◽  
pp. 043304 ◽  
Author(s):  
Yuqing Xu ◽  
Changfeng Fang ◽  
Bin Cui ◽  
Guomin Ji ◽  
Yaxin Zhai ◽  
...  

1990 ◽  
Vol 56 (12) ◽  
pp. 1157-1159 ◽  
Author(s):  
J. Paloheimo ◽  
P. Kuivalainen ◽  
H. Stubb ◽  
E. Vuorimaa ◽  
P. Yli‐Lahti

2005 ◽  
Vol 14 (3-7) ◽  
pp. 509-513 ◽  
Author(s):  
Nobuyuki Kawakami ◽  
Yoshihiro Yokota ◽  
Kazushi Hayashi ◽  
Takeshi Tachibana ◽  
Koji Kobashi

2006 ◽  
Vol 910 ◽  
Author(s):  
Meredith L. Anderson ◽  
R.W. Young ◽  
C.Y. Nakakura

AbstractIn this research, we have employed scanning capacitance microscopy (SCM) to image 2D carrier profiles of a MEMS device. Multiple device states are exercised and examined for changes in carrier response as a function of applied bias. First, experimental and simulated dopant profiles of the source and drain pn junctions were measured with device contacts grounded. Their comparison revealed good agreement. Scanning capacitance microscopy was then used to image changes in carrier distribution within the channel of the device while independent bias voltages were applied to the source, gate, drain, and well regions. Device operation was confirmed by simultaneously measuring the drain current. The SCM image contrast directly beneath the gate was observed to change as a function of applied gate bias voltage.


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