Characterization of Amorphous Silicon Passivation Layer Deposited by Facing Target Sputtering Using Temperature-Dependent Minority Carrier Lifetime Measurement

2017 ◽  
Author(s):  
Y. Shiratori ◽  
K. Nakada ◽  
S. Miyajima
1995 ◽  
Vol 403 ◽  
Author(s):  
R. Venkatasubramanian ◽  
B. O'Quinn ◽  
J. S. Hills ◽  
M. L. Timmons ◽  
D. P. Malta

AbstractThe characterization of MOCVD-grown GaAs-AlGaAs materials and GaAs p+n junctions on poly-Ge substrates is presented. Minority carrier lifetime in GaAs-AIGaAs double-hetero (DH) structures grown on these substrates and the variation of lifetimes across different grainstructures are discussed. Minority-carrier diffusion lengths in polycrystalline GaAs p+-n junctions were evaluated by cross-sectional electron-beam induced current (EBIC) scans. The junctions were also studied by plan-view EBIC imaging. Optimization studies of GaAs solar cell on poly-Ge are discussed briefly. The effect of various polycrystalline substrate-induced defects on performance of GaAs solar cells are presented.


2014 ◽  
Vol 60 ◽  
pp. 181-190
Author(s):  
M. Daanoune ◽  
D. Kohen ◽  
A. Kaminski-Cachopo ◽  
C. Morin ◽  
P. Faucherand ◽  
...  

1990 ◽  
Vol 198 ◽  
Author(s):  
M.M. Al-Jassim ◽  
R.K. Ahrenkiel ◽  
M.W. Wanlass ◽  
J.M. Olson ◽  
S.M. Vernon

ABSTRACTInP and GaInP layers were heteroepitaxially grown on (100) Si substrates by atmospheric pressure MOCVD. TEM and photoluminescence (PL) were used to measure the defect density and the minority carrier lifetime in these structures. The direct growth of InP on Si resulted in either polycrystalline or heavily faulted single-crystal layers. The use of GaAs buffer layers in InP/Si structures gave rise to significantly improved morphology and reduced the threading dislocation density. The best InP/Si layers in this study were obtained by using GaAs-GaInAs graded buffers. Additionally, the growth of high quality GaInP on Si was demonstrated. The minority carrier lifetime of 7 ns in these layers is the highest of any III-V/Si semiconductor measured in our laboratory.


1998 ◽  
Vol 72 (1) ◽  
pp. 103-105 ◽  
Author(s):  
R. Rapaport ◽  
Y. Lubianiker ◽  
I. Balberg ◽  
L. Fonseca

2008 ◽  
Vol 1123 ◽  
Author(s):  
Gregory M. Berman ◽  
Nathan J. Call ◽  
Richard K. Ahrenkiel ◽  
Steven W. Johnston

AbstractWe evaluate four techniques that image minority carrier lifetime, carrier diffusion length, and shunting in solar cells. The techniques include photoluminescence imaging, carrier density imaging, electroluminescence imaging, and dark lock-in thermography shunt detection. We compare these techniques to current industry standards and show how they can yield similar results with higher resolution and in less time.


1990 ◽  
Vol 29 (Part 2, No. 1) ◽  
pp. L166-L168 ◽  
Author(s):  
Takayuki Nammori ◽  
Koji Okamoto ◽  
Tohru Nunoi ◽  
Yutaka Hayashi

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