Characterization of Amorphous Silicon Passivation Layer Deposited by Facing Target Sputtering Using Temperature-Dependent Minority Carrier Lifetime Measurement
2015 ◽
2016 ◽
Vol 55
(4S)
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pp. 04ES04
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Keyword(s):
Keyword(s):
1990 ◽
Vol 29
(Part 2, No. 1)
◽
pp. L166-L168
◽
Keyword(s):