calcium vapor
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2021 ◽  
Vol 59 (3) ◽  
pp. 149-154
Author(s):  
Jung-Min Oh ◽  
Jaeyeol Yang ◽  
Jaesik Yoon ◽  
Jae-Won Lim

In this study, an effective method is demonstrated for fabricating titanium sputtering targets, which are used to fabricate thin films in the semiconductor industry. The method is an alternative to the existing electron beam melting (EBM) process under high vacuum. Titanium sputtering targets used in the production of semiconductors must have very low concentrations of gaseous impurities, especially oxygen, as well as metal impurities. Currently, the oxygen concentration in titanium sputtering targets used for industrial purposes is less than 400 ppm. To develop an effective alternative method, powder metallurgy and melting processes were performed to prepare a low-oxygen titanium ingot with less than 400 ppm oxygen. First, titanium powder was deoxidized using calcium vapor, and then the powder was subjected to vacuum arc melting (VAM). The oxygen in the titanium powder was reduced with calcium vapor from an initial concentration of 2200 ppm to 800 ppm, and the resulting powder was melted using VAM, resulting in titanium ingots with low oxygen content, 400 ppm or less. It was also confirmed that all lattice constants, i.e., <i>d, a, c,</i> and <i>c/a</i>, decreased as oxygen concentration decreased in both the titanium powder and the ingots.



2020 ◽  
Vol 828 ◽  
pp. 154220 ◽  
Author(s):  
Taeheon Kim ◽  
Jung-Min Oh ◽  
Gye-hoon Cho ◽  
Jeshin Park ◽  
Jae-Won Lim


Vacuum ◽  
2020 ◽  
Vol 173 ◽  
pp. 109133 ◽  
Author(s):  
Fengkang Wang ◽  
Baoqiang Xu ◽  
Heli Wan ◽  
Jia Yang ◽  
Bin Yang ◽  
...  
Keyword(s):  


2020 ◽  
Vol 56 (1) ◽  
pp. 35-41 ◽  
Author(s):  
V. N. Kolosov ◽  
V. M. Orlov ◽  
M. N. Miroshnichenko
Keyword(s):  
Group V ◽  


2019 ◽  
Vol 484 (4) ◽  
pp. 447-450
Author(s):  
V. N. Kolosov ◽  
V. M. Orlov

The reduction of tungsten and molybdenum oxide compounds (WO3, MoO3, MgWO4, MgMoO4, and CaMoO4) with calcium vapor at 800–860°С and a residual argon pressure of 5–10 kPa in reactor have been studied. As previously during the reduction with magnesium vapor, the spatial separation of the reaction products was observed, namely, the major portion of the calcium oxide formed in the reaction was deposited outside the reaction zone. A specific feature of the reduction of MgWO4 and MgMoO4 is that the magnesium is first replaced by calcium. The resulting magnesium metal acts as a reducing agent, and the magnesium oxide, along with calcium oxide, forms a crust on the surface of the reaction mass. Analysis of the results shows that the reduction of oxide compounds with magnesium and calcium vapors at a residual argon pressure in reactor of more than 5 kPa proceeds via the electronically mediated reaction mechanism without direct physical contact between the reactants.



2018 ◽  
Vol 29 (7) ◽  
pp. 1640-1643 ◽  
Author(s):  
Chon-Il Hong ◽  
Jung-Min Oh ◽  
Jeshin Park ◽  
Jeong-Mo Yoon ◽  
Jae-Won Lim


Author(s):  
Nathan Lemke ◽  
Kyle W. Martin ◽  
Jarom Jackson ◽  
Christopher Erickson ◽  
Jordan Armstrong ◽  
...  


2017 ◽  
Vol 48 (3) ◽  
pp. 1715-1720 ◽  
Author(s):  
Martin Berg ◽  
Jaewoo Lee ◽  
Du Sichen


2016 ◽  
Vol 120 (30) ◽  
pp. 16850-16862 ◽  
Author(s):  
James M. Lownsbury ◽  
Iván A. Santos-López ◽  
Wei Zhang ◽  
Charles T. Campbell ◽  
Haoyu S. Yu ◽  
...  


Author(s):  
Baoqiang Xu ◽  
Dongsheng Wang ◽  
Bin Yang ◽  
Yongnian Dai


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