2009 International Workshop on Junction Technology
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9781424433193
Latest Documents Most Cited Documents Contributed Authors Related Sources Related Keywords

Influence of amorphization depth on sheet resistance in shallow junction formation with B cluster implantation

2009 ◽  
Author(s):  
Yoji Kawasaki ◽  
Yoshiki Maruyama ◽  
Hidefumi Yoshimura ◽  
Hiroshi Miyatake ◽  
Kentaro Shibahara
Keyword(s):  
Sheet Resistance ◽  
Shallow Junction ◽  
Junction Formation

Recent advance in single-ion implantation method for single-dopant devices

2009 ◽  
Author(s):  
Takahiro Shinada ◽  
Masahiro Hori ◽  
Keigo Taira ◽  
Tetsuo Endoh ◽  
Iwao Ohdomari
Keyword(s):  
Ion Implantation ◽  
Implantation Method

The impact of junction depth on vertical sidewall MOSFETs with embedded gate

2009 ◽  
Author(s):  
Chih-Hao Kuo ◽  
Jyi-Tsong Lin ◽  
Tai-Yi Lee ◽  
Yi-Chuen Eng ◽  
Tzu-Feng Chang ◽  
...  
Keyword(s):  
Junction Depth ◽  
Vertical Sidewall ◽  
The Impact

Electrical transport characterization of nano CMOS devices with ultra-thin silicon film

2009 ◽  
Author(s):  
G. Ghibaudo ◽  
M. Mouis ◽  
L. Pham-Nguyen ◽  
K. Bennamane ◽  
I. Pappas ◽  
...  
Keyword(s):  
Electrical Transport ◽  
Silicon Film ◽  
Thin Silicon ◽  
Thin Silicon Film
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