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Automatic Virtual Metrology (AVM)
Mapping Intimacies
◽
10.1002/9781119739920.ch8
◽
2021
◽
pp. 275-329
Author(s):
Fan‐Tien Cheng
Keyword(s):
Virtual Metrology
Download Full-text
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References
A hybrid feature selection approach for virtual metrology: Application to CMP process
2021 32nd Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)
◽
10.1109/asmc51741.2021.9435673
◽
2021
◽
Author(s):
Taki Eddine KORABI
◽
Valeria BORODIN
◽
Michel JUGE
◽
Agnes ROUSSY
Keyword(s):
Feature Selection
◽
Virtual Metrology
◽
Selection Approach
◽
Feature Selection Approach
Download Full-text
Machine learning-based virtual metrology on film thickness in amorphous carbon layer deposition process
Measurement: Sensors
◽
10.1016/j.measen.2021.100046
◽
2021
◽
Vol 16
◽
pp. 100046
Author(s):
Jeong Eun Choi
◽
Sang Jeen Hong
Keyword(s):
Machine Learning
◽
Film Thickness
◽
Amorphous Carbon
◽
Deposition Process
◽
Carbon Layer
◽
Virtual Metrology
◽
Layer Deposition
◽
Amorphous Carbon Layer
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Enhancing Scalability of Virtual Metrology: A Deep Learning-Based Approach for Domain Adaptation
2020 Winter Simulation Conference (WSC)
◽
10.1109/wsc48552.2020.9383945
◽
2020
◽
Author(s):
Natalie Gentner
◽
Andreas Kyek
◽
Yao Yang
◽
Mattia Carletti
◽
Gian Antonio Susto
Keyword(s):
Deep Learning
◽
Domain Adaptation
◽
Virtual Metrology
Download Full-text
What are the Most Informative Data for Virtual Metrology? A use case on Multi-Stage Processes Fault Prediction
2019 IEEE 15th International Conference on Automation Science and Engineering (CASE)
◽
10.1109/coase.2019.8842942
◽
2019
◽
Author(s):
Marco Maggipinto
◽
Gian Antonio Susto
◽
Federico Zocco
◽
Sean McLoone
Keyword(s):
Fault Prediction
◽
Use Case
◽
Virtual Metrology
◽
Multi Stage
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Virtual metrology for TSV etch depth measurement using optical emission spectroscopy
2015 IEEE Electrical Design of Advanced Packaging and Systems Symposium (EDAPS)
◽
10.1109/edaps.2015.7383700
◽
2015
◽
Cited By ~ 1
Author(s):
Ja Myung Gu
◽
Sang Jeen Hong
Keyword(s):
Emission Spectroscopy
◽
Optical Emission Spectroscopy
◽
Optical Emission
◽
Etch Depth
◽
Depth Measurement
◽
Virtual Metrology
Download Full-text
A virtual equipment as a test bench for evaluating Virtual Metrology algorithms
Proceedings of the 2011 Winter Simulation Conference (WSC)
◽
10.1109/wsc.2011.6147902
◽
2011
◽
Cited By ~ 1
Author(s):
Andreas Mattes
◽
Matthias Koitzsch
◽
Dirk Lewke
◽
Michael Muller-Zell
◽
Martin Schellenberger
Keyword(s):
Test Bench
◽
Virtual Metrology
Download Full-text
Multivariate simulation assessment for virtual metrology
Proceedings 2006 IEEE International Conference on Robotics and Automation, 2006. ICRA 2006.
◽
10.1109/robot.2006.1641848
◽
2006
◽
Cited By ~ 4
Author(s):
Yeh-Tung Chen
◽
Haw-Ching Yang
◽
Fan-Tien Cheng
Keyword(s):
Virtual Metrology
◽
Multivariate Simulation
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Virtual Metrology for Etch Profile in Silicon Trench Etching with SF6/O2/Ar Plasma
IEEE Transactions on Semiconductor Manufacturing
◽
10.1109/tsm.2021.3138918
◽
2021
◽
pp. 1-1
Author(s):
Jeong Eun Choi
◽
Hyoeun Park
◽
Yongho Lee
◽
Sang Jeen Hong
Keyword(s):
Virtual Metrology
◽
Ar Plasma
◽
Etch Profile
Download Full-text
Preliminary study of run-to-run control utilizing virtual metrology with reliance index
2011 IEEE International Conference on Automation Science and Engineering
◽
10.1109/case.2011.6042446
◽
2011
◽
Cited By ~ 6
Author(s):
Chi-An Kao
◽
Fan-Tien Cheng
◽
Wei-Ming Wu
Keyword(s):
Virtual Metrology
◽
Preliminary Study
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A novel automatic virtual metrology system architecture for TFT-LCD industry based on main memory database
Robotics and Computer-Integrated Manufacturing
◽
10.1016/j.rcim.2012.01.002
◽
2012
◽
Vol 28
(4)
◽
pp. 559-568
◽
Cited By ~ 9
Author(s):
Min-Hsiung Hung
◽
Wen-Huang Tsai
◽
Haw-Ching Yang
◽
Yi-Jhong Kao
◽
Fan-Tien Cheng
Keyword(s):
System Architecture
◽
Main Memory
◽
Virtual Metrology
◽
Main Memory Database
◽
Metrology System
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