Reactivity of organosilicon precursors in remote hydrogen microwave plasma chemical vapor deposition of silicon carbide and silicon carbonitride thin-film coatings

Film Coatings ◽

Thin Film Coatings

Hard silicon carbonitride thin‐film coatings by remote hydrogen plasma chemical vapor deposition using aminosilane and silazane precursors. 2: Physical, optical, and mechanical properties of deposited films

Plasma Processes and Polymers ◽

10.1002/ppap.202000241 ◽

2021 ◽

Vol 18 (4) ◽

pp. 2000241

Author(s):

Aleksander M. Wrobel ◽

Pawel Uznanski

Keyword(s):

Vapor Deposition ◽

Hydrogen Plasma ◽

Chemical Vapor ◽

Silicon Carbonitride ◽

Plasma Chemical ◽

Film Coatings ◽

Thin Film Coatings ◽

Optical And Mechanical Properties ◽

Deposited Films

Hard silicon carbonitride thin‐film coatings produced by remote hydrogen plasma chemical vapor deposition using aminosilane and silazane precursors. 1: Deposition mechanism, chemical structure, and surface morphology

Plasma Processes and Polymers ◽

10.1002/ppap.202000240 ◽

2021 ◽

Author(s):

Aleksander M. Wrobel ◽

Pawel Uznanski

Keyword(s):

Vapor Deposition ◽

Chemical Structure ◽

Hydrogen Plasma ◽

Chemical Vapor ◽

Silicon Carbonitride ◽

Plasma Chemical ◽

Deposition Mechanism ◽

Film Coatings ◽

Thin Film Coatings

Silicon carbonitride thin-film coatings fabricated by remote hydrogen–nitrogen microwave plasma chemical vapor deposition from a single-source precursor: Growth process, structure, and properties of the coatings

Journal of Applied Polymer Science ◽

10.1002/app.26109 ◽

2007 ◽

Vol 105 (1) ◽

pp. 122-129 ◽

Cited By ~ 14

Author(s):

A. M. Wrobel ◽

I. Blaszczyk-Lezak ◽

A. Walkiewicz-Pietrzykowska

Keyword(s):

Microwave Plasma ◽

Chemical Vapor ◽

Silicon Carbonitride ◽

Structure And Properties ◽

Plasma Chemical ◽

Film Coatings ◽

Thin Film Coatings ◽

Single Source Precursor ◽

Process Structure

Remote hydrogen microwave plasma chemical vapor deposition of silicon carbonitride films from a (dimethylamino)dimethylsilane precursor: Characterization of the process, chemical structure, and surface morphology of the films

Diamond and Related Materials ◽

10.1016/j.diamond.2005.11.011 ◽

2006 ◽

Vol 15 (9) ◽

pp. 1484-1491 ◽

Cited By ~ 11

Author(s):

I. Blaszczyk-Lezak ◽

A.M. Wrobel ◽

M.P.M. Kivitorma ◽

I.J. Vayrynen ◽

T. Aoki

Keyword(s):

Surface Morphology ◽

Vapor Deposition ◽

Chemical Structure ◽

Microwave Plasma ◽

Chemical Vapor ◽

Silicon Carbonitride ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition

Diamond thin film preparation by microwave plasma chemical vapor deposition under the open-air condition

2009 IEEE International Conference on Plasma Science - Abstracts ◽

10.1109/plasma.2009.5227474 ◽

2009 ◽

Author(s):

Kenichiro Hamanishi ◽

Hiroyuki Goto ◽

Hideki Motomura ◽

Masafumi Jinno ◽

Hidetsugu Yagi

Keyword(s):

Thin Film ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Plasma Chemical ◽

Diamond Thin Film ◽

Thin Film Preparation ◽

Film Preparation

Remote nitrogen microwave plasma chemical vapor deposition from a tetramethyldisilazane precursor. 2. Properties of deposited silicon carbonitride films

Thin Solid Films ◽

10.1016/j.tsf.2005.09.191 ◽

2006 ◽

Vol 497 (1-2) ◽

pp. 35-41 ◽

Cited By ~ 15

Author(s):

I. Blaszczyk-Lezak ◽

A.M. Wrobel ◽

D.M. Bielinski

Keyword(s):

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Silicon Carbonitride ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition

Amorphous silicon carbonitride thin-film coatings produced by remote nitrogen microwave plasma chemical vapour deposition using organosilicon precursor

Applied Organometallic Chemistry ◽

10.1002/aoc.3871 ◽

2017 ◽

Vol 31 (12) ◽

pp. e3871 ◽

Cited By ~ 3

Author(s):

A.M. Wrobel ◽

P. Uznanski ◽

A. Walkiewicz-Pietrzykowska ◽

K. Jankowski

Keyword(s):

Thin Film ◽

Amorphous Silicon ◽

Vapour Deposition ◽

Microwave Plasma ◽

Chemical Vapour ◽

Silicon Carbonitride ◽

Plasma Chemical ◽

Film Coatings ◽

Thin Film Coatings ◽

Plasma Chemical Vapour Deposition

Homoepitaxial Growth of 4H-SiC Thin Film Below 1000°C by Microwave Plasma Chemical Vapor Deposition

Materials Science Forum ◽

10.4028/www.scientific.net/msf.389-393.299 ◽

2002 ◽

Vol 389-393 ◽

pp. 299-302 ◽

Cited By ~ 2

Author(s):

Mitsuo Okamoto ◽

Yasunori Tanaka ◽

Ryouji Kosugi ◽

Daisuke Takeuchi ◽

Shinichi Nakashima ◽

...

Keyword(s):

Thin Film ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Plasma Chemical ◽

Homoepitaxial Growth

Remote hydrogen microwave plasma chemical vapor deposition of silicon carbonitride films from a (dimethylamino)dimethylsilane precursor: Compositional and structural dependencies of film properties

Diamond and Related Materials ◽

10.1016/j.diamond.2006.01.019 ◽

2006 ◽

Vol 15 (10) ◽

pp. 1650-1658 ◽

Cited By ~ 24

Author(s):

I. Blaszczyk-Lezak ◽

A.M. Wrobel ◽

D.M. Bielinski

Keyword(s):

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Silicon Carbonitride ◽

Plasma Chemical ◽

Film Properties ◽

Plasma Chemical Vapor Deposition

Microwave plasma chemical vapor deposition of nano-structured Sn/C composite thin-film anodes for Li-ion batteries

Journal of Power Sources ◽

10.1016/j.jpowsour.2007.08.084 ◽

2007 ◽

Vol 173 (2) ◽

pp. 965-971 ◽

Cited By ~ 73

Author(s):

M. Marcinek ◽

L.J. Hardwick ◽

T.J. Richardson ◽

X. Song ◽

R. Kostecki

Keyword(s):

Thin Film ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Composite Thin Film ◽

Li Ion Batteries ◽

Plasma Chemical ◽

Li Ion