Remote hydrogen microwave plasma chemical vapor deposition of silicon carbonitride films from a (dimethylamino)dimethylsilane precursor: Compositional and structural dependencies of film properties
2006 ◽
Vol 15
(10)
◽
pp. 1650-1658
◽
2006 ◽
Vol 15
(9)
◽
pp. 1484-1491
◽
2011 ◽
Vol 8
(6)
◽
pp. 542-556
◽
1989 ◽
Vol 50
(C5)
◽
pp. C5-667-C5-672
1992 ◽
Vol 212
(1-2)
◽
pp. 140-149
◽