Silicon carbonitride thin-film coatings fabricated by remote hydrogen–nitrogen microwave plasma chemical vapor deposition from a single-source precursor: Growth process, structure, and properties of the coatings

Film Coatings ◽

Thin Film Coatings ◽

Single Source Precursor ◽

Process Structure

Reactivity of organosilicon precursors in remote hydrogen microwave plasma chemical vapor deposition of silicon carbide and silicon carbonitride thin-film coatings

Applied Organometallic Chemistry ◽

10.1002/aoc.1589 ◽

2010 ◽

Vol 24 (3) ◽

pp. 201-207 ◽

Cited By ~ 6

Author(s):

A. M. Wrobel ◽

A. Walkiewicz-Pietrzykowska ◽

I. Blaszczyk-Lezak

Keyword(s):

Thin Film ◽

Silicon Carbide ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Silicon Carbonitride ◽

Plasma Chemical ◽

Film Coatings ◽

Thin Film Coatings

Hard silicon carbonitride thin‐film coatings by remote hydrogen plasma chemical vapor deposition using aminosilane and silazane precursors. 2: Physical, optical, and mechanical properties of deposited films

Plasma Processes and Polymers ◽

10.1002/ppap.202000241 ◽

2021 ◽

Vol 18 (4) ◽

pp. 2000241

Author(s):

Aleksander M. Wrobel ◽

Pawel Uznanski

Keyword(s):

Vapor Deposition ◽

Hydrogen Plasma ◽

Chemical Vapor ◽

Silicon Carbonitride ◽

Plasma Chemical ◽

Film Coatings ◽

Thin Film Coatings ◽

Optical And Mechanical Properties ◽

Deposited Films

Hard silicon carbonitride thin‐film coatings produced by remote hydrogen plasma chemical vapor deposition using aminosilane and silazane precursors. 1: Deposition mechanism, chemical structure, and surface morphology

Plasma Processes and Polymers ◽

10.1002/ppap.202000240 ◽

2021 ◽

Author(s):

Aleksander M. Wrobel ◽

Pawel Uznanski

Keyword(s):

Vapor Deposition ◽

Chemical Structure ◽

Hydrogen Plasma ◽

Chemical Vapor ◽

Silicon Carbonitride ◽

Plasma Chemical ◽

Deposition Mechanism ◽

Film Coatings ◽

Thin Film Coatings

Remote hydrogen microwave plasma chemical vapor deposition of silicon carbonitride films from a (dimethylamino)dimethylsilane precursor: Characterization of the process, chemical structure, and surface morphology of the films

Diamond and Related Materials ◽

10.1016/j.diamond.2005.11.011 ◽

2006 ◽

Vol 15 (9) ◽

pp. 1484-1491 ◽

Cited By ~ 11

Author(s):

I. Blaszczyk-Lezak ◽

A.M. Wrobel ◽

M.P.M. Kivitorma ◽

I.J. Vayrynen ◽

T. Aoki

Keyword(s):

Surface Morphology ◽

Vapor Deposition ◽

Chemical Structure ◽

Microwave Plasma ◽

Chemical Vapor ◽

Silicon Carbonitride ◽

Plasma Chemical ◽

Hard a-SiC:H films formed by remote hydrogen microwave plasma chemical vapor deposition using a novel single-source precursor

Thin Solid Films ◽

10.1016/j.tsf.2012.08.001 ◽

2012 ◽

Vol 520 (24) ◽

pp. 7100-7108 ◽

Cited By ~ 12

Author(s):

A.M. Wrobel ◽

A. Walkiewicz-Pietrzykowska ◽

P. Uznanski ◽

B. Glebocki

Keyword(s):

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Single Source ◽

Plasma Chemical ◽

Single Source Precursor

Remote nitrogen microwave plasma chemical vapor deposition from a tetramethyldisilazane precursor. 2. Properties of deposited silicon carbonitride films

Thin Solid Films ◽

10.1016/j.tsf.2005.09.191 ◽

2006 ◽

Vol 497 (1-2) ◽

pp. 35-41 ◽

Cited By ~ 15

Author(s):

I. Blaszczyk-Lezak ◽

A.M. Wrobel ◽

D.M. Bielinski

Keyword(s):

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Silicon Carbonitride ◽

Plasma Chemical ◽

Amorphous silicon carbonitride thin-film coatings produced by remote nitrogen microwave plasma chemical vapour deposition using organosilicon precursor

Applied Organometallic Chemistry ◽

10.1002/aoc.3871 ◽

2017 ◽

Vol 31 (12) ◽

pp. e3871 ◽

Cited By ~ 3

Author(s):

A.M. Wrobel ◽

P. Uznanski ◽

A. Walkiewicz-Pietrzykowska ◽

K. Jankowski

Keyword(s):

Thin Film ◽

Amorphous Silicon ◽

Vapour Deposition ◽

Microwave Plasma ◽

Chemical Vapour ◽

Silicon Carbonitride ◽

Plasma Chemical ◽

Film Coatings ◽

Thin Film Coatings ◽

Plasma Chemical Vapour Deposition

Remote hydrogen microwave plasma chemical vapor deposition of silicon carbonitride films from a (dimethylamino)dimethylsilane precursor: Compositional and structural dependencies of film properties

Diamond and Related Materials ◽

10.1016/j.diamond.2006.01.019 ◽

2006 ◽

Vol 15 (10) ◽

pp. 1650-1658 ◽

Cited By ~ 24

Author(s):

I. Blaszczyk-Lezak ◽

A.M. Wrobel ◽

D.M. Bielinski

Keyword(s):

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Silicon Carbonitride ◽

Plasma Chemical ◽

Film Properties ◽

Remote hydrogen–nitrogen plasma chemical vapor deposition from a tetramethyldisilazane source. Part 1. Mechanism of the process, structure and surface morphology of deposited amorphous hydrogenated silicon carbonitride filmsElectronic supplementary information (ESI) available: deconvoluted emission and IR spectra of a-Si–N–C–H films. See http://www.rsc.org/suppdata/jm/b2/b211415c/

Journal of Materials Chemistry ◽

10.1039/b211415c ◽

2003 ◽

Vol 13 (4) ◽

pp. 731-737 ◽

Cited By ~ 43

Author(s):

A. M. Wróbel ◽

I. Błaszczyk ◽

A. Walkiewicz-Pietrzykowska ◽

A. Tracz ◽

J. E. Klemberg-Sapieha ◽

...

Keyword(s):

Vapor Deposition ◽

Chemical Vapor ◽

Nitrogen Plasma ◽

Silicon Carbonitride ◽

Supplementary Information ◽

Plasma Chemical ◽

Hydrogenated Silicon ◽

Amorphous Hydrogenated Silicon ◽

Process Structure

Remote Hydrogen Microwave Plasma Chemical Vapor Deposition of Amorphous Silicon Carbonitride (a-SiCN) Coatings Derived From Tris(dimethylamino)Silane

Plasma Processes and Polymers ◽

10.1002/ppap.201000203 ◽

2011 ◽

Vol 8 (6) ◽

pp. 542-556 ◽

Cited By ~ 16

Author(s):

Aleksander M. Wrobel ◽

Iwona Blaszczyk-Lezak ◽

Pawel Uznanski ◽

Bartosz Glebocki

Keyword(s):

Amorphous Silicon ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Silicon Carbonitride ◽

Plasma Chemical ◽