Amorphous silicon carbonitride thin-film coatings produced by remote nitrogen microwave plasma chemical vapour deposition using organosilicon precursor

2017 ◽  
Vol 31 (12) ◽  
pp. e3871 ◽  
Author(s):  
A.M. Wrobel ◽  
P. Uznanski ◽  
A. Walkiewicz-Pietrzykowska ◽  
K. Jankowski
Keyword(s):  
Thin Film ◽  
Amorphous Silicon ◽  
Vapour Deposition ◽  
Microwave Plasma ◽  
Chemical Vapour ◽  
Silicon Carbonitride ◽  
Plasma Chemical ◽  
Film Coatings ◽  
Thin Film Coatings ◽  
Plasma Chemical Vapour Deposition

MICROWAVE PLASMA CHEMICAL VAPOUR DEPOSITION OF DIAMOND: ITS GROWTH AND CHARACTERIZATION

1990 ◽  
pp. 53-62
Author(s):  
CHIA-FU CHEN ◽  
KAZUHITO NISHIMURA ◽  
ENSEI KO ◽  
EIJI OGAWA ◽  
SATORU HOSOMI ◽  
...  
Keyword(s):  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Microwave Plasma ◽  
Chemical Vapour ◽  
Plasma Chemical ◽  
Plasma Chemical Vapour Deposition

Thermoelectric power of polycrystalline Si films prepared by microwave plasma chemical vapour deposition

1996 ◽  
Vol 281-282 ◽  
pp. 159-161 ◽  
Author(s):  
So Yonekubo ◽  
Kiichi Kamimura ◽  
Yoshiharu Onuma
Keyword(s):  
Thermoelectric Power ◽  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Microwave Plasma ◽  
Chemical Vapour ◽  
Plasma Chemical ◽  
Plasma Chemical Vapour Deposition ◽  
Si Films

Diamond film growth by pulse-modulated magnetoactive microwave plasma chemical vapour deposition

1996 ◽  
Vol 281-282 ◽  
pp. 264-266 ◽  
Author(s):  
Akimitsu Hatta ◽  
Hidetoshi Suzuki ◽  
Ken-ichi Kadota ◽  
Toshimichi Ito ◽  
Akio Hiraki
Keyword(s):  
Chemical Vapour Deposition ◽  
Diamond Film ◽  
Vapour Deposition ◽  
Film Growth ◽  
Microwave Plasma ◽  
Chemical Vapour ◽  
Plasma Chemical ◽  
Plasma Chemical Vapour Deposition ◽  
Diamond Film Growth

Investigation of Diamond Particles Grown by Microwave Plasma CVD on Tungsten Wire Tips.

1990 ◽  
Vol 202 ◽  
Author(s):  
Sue-Anne Stuart ◽  
Steven Prawer ◽  
Alon Hoffman ◽  
Alec Moodie ◽  
Paul Weiser
Keyword(s):  
Vapour Deposition ◽  
Microwave Plasma ◽  
Chemical Vapour ◽  
Plasma Cvd ◽  
Plasma Chemical ◽  
Diamond Particles ◽  
Microwave Plasma Cvd ◽  
Large Growth ◽  
Plasma Chemical Vapour Deposition ◽  
Large Diamond

ABSTRACTLarge diamond particles up to 30μm in diameter have been deposited on W wire tips using Microwave Plasma Chemical Vapour Deposition. Raman, SEM and TEM investigations were all carried out on a single particle. Large growth steps were observed on (100) facets but were absent on the (111) facets. Raman measurements indicated greater crystalline quality for (100) than (111) facets. TEM revealed the (111) facets to be covered with small islands of diamond about 10Å high. The dominant defect was found to be stacking faulting on the {111} planes which gives rise to some hexagonal spacings in the electron diffraction pattern. The results suggest that growth in the <111> and <100> directions are driven by different mechanisms.

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