Hard silicon carbonitride thin‐film coatings produced by remote hydrogen plasma chemical vapor deposition using aminosilane and silazane precursors. 1: Deposition mechanism, chemical structure, and surface morphology

2021 ◽  
Author(s):  
Aleksander M. Wrobel ◽  
Pawel Uznanski
Keyword(s):  
Vapor Deposition ◽  
Chemical Structure ◽  
Hydrogen Plasma ◽  
Chemical Vapor ◽  
Silicon Carbonitride ◽  
Plasma Chemical ◽  
Deposition Mechanism ◽  
Plasma Chemical Vapor Deposition ◽  
Film Coatings ◽  
Thin Film Coatings

scholarly journals Synthesis of Multiwalled Carbon Nanotubes on Stainless Steel by Atmospheric Pressure Microwave Plasma Chemical Vapor Deposition

2020 ◽  
Vol 10 (13) ◽  
pp. 4468 ◽  
Author(s):  
Dashuai Li ◽  
Ling Tong ◽  
Bo Gao
Keyword(s):  
Carbon Nanotubes ◽  
Stainless Steel ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Atmospheric Pressure ◽  
Microwave Plasma ◽  
Hydrogen Plasma ◽  
Chemical Vapor ◽  
Plasma Chemical ◽  
Plasma Chemical Vapor Deposition

In this paper, we synthesize carbon nanotubes (CNTs) by using atmospheric pressure microwave plasma chemical vapor deposition (AMPCVD). In AMPCVD, a coaxial plasma generator provides 200 W 2.45 GHz microwave plasma at atmospheric pressure to decompose the precursor. A high-temperature tube furnace provides a suitable growth temperature for the deposition of CNTs. Optical fiber spectroscopy was used to measure the compositions of the argon–ethanol–hydrogen plasma. A comparative experiment of ethanol precursor decomposition, with and without plasma, was carried out to measure the role of the microwave plasma, showing that the 200 W microwave plasma can decompose 99% of ethanol precursor at any furnace temperature. CNTs were prepared on a stainless steel substrate by using the technology to decompose ethanol with the plasma power of 200 W at the temperatures of 500, 600, 700, and 800 °C; CNT growth increases with the increase in temperature. Prepared CNTs, analyzed by SEM and HRTEM, were shown to be multiwalled and tangled with each other. The measurement of XPS and Raman spectroscopy indicates that many oxygenated functional groups have attached to the surface of the CNTs.

Remote Hydrogen Plasma Chemical Vapor Deposition from (Dimethylsilyl)(trimethylsilyl)methane. 1. Kinetics of the Process; Chemical and Morphological Structure of Deposited Silicon−Carbon Films

2003 ◽  
Vol 15 (8) ◽  
pp. 1749-1756 ◽  
Author(s):  
A. M. Wróbel ◽  
A. Walkiewicz-Pietrzykowska ◽  
J. E. Klemberg-Sapieha ◽  
Y. Nakanishi ◽  
T. Aoki ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Hydrogen Plasma ◽  
Morphological Structure ◽  
Chemical Vapor ◽  
Carbon Films ◽  
Plasma Chemical ◽  
Plasma Chemical Vapor Deposition ◽  
Silicon Carbon ◽  
Kinetics Of

Remote Hydrogen Plasma Chemical Vapor Deposition from (Dimethylsilyl)(trimethylsilyl)methane. 2. Property−Structure Relationships for Resulting Silicon−Carbon Films

2003 ◽  
Vol 15 (8) ◽  
pp. 1757-1762 ◽  
Author(s):  
A. M. Wróbel ◽  
A. Walkiewicz-Pietrzykowska ◽  
D. M. Bieliński ◽  
J. E. Klemberg-Sapieha ◽  
Y. Nakanishi ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Hydrogen Plasma ◽  
Chemical Vapor ◽  
Carbon Films ◽  
Plasma Chemical ◽  
Plasma Chemical Vapor Deposition ◽  
Silicon Carbon
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