Thickness Measurement and Control in the Manufacture of Polyethylene Cable Sheath

1954 ◽  
Vol 33 (3) ◽  
pp. 559-577
Author(s):  
W. T. Eppler
1985 ◽  
Vol 28 (6) ◽  
pp. 30-32
Author(s):  
Arvind Arora

This paper presents a new technique to measure thin layer contamination on the surface of a material. The technique uses low wavelength ultraviolet irradiation to generate optically stimulated electron emission, also known as photo electron emission, which can be used to evaluate surface cleanliness or surface chemical state. Limited data is presented to show application of this technique to wafer processing, disk lubricant thickness measurement and quality control of printed circuit boards.


1993 ◽  
Author(s):  
Steven A. Henck ◽  
Walter M. Duncan ◽  
Lee M. Loewenstein ◽  
John Kuehne

2001 ◽  
Author(s):  
G. Mainelis ◽  
R. Gorny ◽  
K. Willeke ◽  
S. Grinshpun ◽  
T. Reponen ◽  
...  

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