Surface modification of expanded poly(tetrafluoroethylene) by means of microwave plasma treatment for improvement of adhesion and growth of human endothelial cells

1996 ◽  
Vol 103 (1) ◽  
pp. 243-257 ◽  
Author(s):  
F. Simon ◽  
G. Hermel ◽  
D. Lunkwitz ◽  
C. Werner ◽  
K. Eichhorn ◽  
...  
2019 ◽  
Vol 2019 ◽  
pp. 1-9
Author(s):  
Yanjie Yang ◽  
Dehui Xu ◽  
Ning Ning ◽  
Yujing Xu

Cold atmospheric plasma (CAP) is a novel technology, which has been widely applied in biomedicine, especially in wound healing, dermatological treatment, hemostasis, and cancer treatment. In most cases, CAP treatment will interact with innumerable blood capillaries. Therefore, it is important and necessary to understand the effects of CAP treatment on endothelial cell metabolism. In this study, the metabolite profiling of plasma treatment on endothelial cells was measured by gas chromatography tandem time-of-flight mass spectrometry (GC-TOF-MS). We found that 695 signals (metabolites) were detected by GC-TOF-MS and then evaluated using orthogonal projections to latent structures discriminant analysis (OPLS-DA). All the differential metabolites were listed, and proline and xanthosine were the two of the most downregulated metabolites by plasma treatment. By comprehensive metabolic pathway analysis with the KEGG pathway, we showed that alanine, aspartate, glutamate, and purine metabolism pathways were the most significantly suppressed after gas plasma treatment in human endothelial cells. Our finding gives an overall picture of the metabolic pathways affected by plasma treatment in endothelial cells.


2012 ◽  
Vol 8 (3) ◽  
pp. 327-337 ◽  
Author(s):  
Claudia Kleinhans ◽  
Jakob Barz ◽  
Simone Wurster ◽  
Marleen Willig ◽  
Christian Oehr ◽  
...  

Coatings ◽  
2021 ◽  
Vol 11 (8) ◽  
pp. 923
Author(s):  
Nattakorn Borwornpornmetee ◽  
Peerasil Charoenyuenyao ◽  
Rawiwan Chaleawpong ◽  
Boonchoat Paosawatyanyong ◽  
Rungrueang Phatthanakun ◽  
...  

Fe3Si films are deposited onto the Si(111) wafer using sputtering with parallel facing targets. Surface modification of the deposited Fe3Si film is conducted by using a microwave plasma treatment under an Ar atmosphere at different powers of 50, 100 and, 150 W. After the Ar plasma treatment, the crystallinity of the coated Fe3Si films is enhanced, in which the orientation peaks, including (220), (222), (400), and (422) of the Fe3Si are sharpened. The extinction rule suggests that the B2–Fe3Si crystallites are the film’s dominant composition. The stoichiometry of the Fe3Si surfaces is marginally changed after the treatment. An increase in microwave power damages the surface of the Fe3Si films, resulting in the generation of small pinholes. The roughness of the Fe3Si films after being treated at 150 W is insignificantly increased compared to the untreated films. The untreated Fe3Si films have a hydrophobic surface with an average contact angle of 101.70°. After treatment at 150 W, it turns into a hydrophilic surface with an average contact angle of 67.05° because of the reduction in the hydrophobic carbon group and the increase in the hydrophilic oxide group. The hardness of the untreated Fe3Si is ~9.39 GPa, which is kept at a similar level throughout each treatment power.


2017 ◽  
Vol 420 ◽  
pp. 579-585 ◽  
Author(s):  
Andrea Grandoni ◽  
Giacomo Mannini ◽  
Antonella Glisenti ◽  
Antonella Manariti ◽  
Giancarlo Galli

2005 ◽  
pp. 157-176 ◽  
Author(s):  
Mihaela Pascu ◽  
Dominique Debarnot ◽  
S. Durand ◽  
Fabienne Poncin-Epaillard

Sign in / Sign up

Export Citation Format

Share Document