In‐situ and ex‐situ micro mechanical testing of open‐cell metal foams

PAMM ◽  
2018 ◽  
Vol 18 (1) ◽  
Author(s):  
Anne Jung ◽  
Jutta Luksch ◽  
Thomas Bleistein ◽  
Jerome Adrien ◽  
Eric Maire
Keyword(s):  
Mechanical Testing ◽  
Metal Foams ◽  
Ex Situ ◽  
Open Cell

Fatigue of As-Fabricated Open Cell Aluminum Foams

2005 ◽  
Vol 127 (1) ◽  
pp. 40-45 ◽  
Author(s):  
J. Zhou ◽  
Z. Gao ◽  
A. M. Cuitino ◽  
W. O. Soboyejo
Keyword(s):  
Shear Bands ◽  
Digital Camera ◽  
Image Correlation ◽  
Ex Situ ◽  
Aluminum Foams ◽  
Open Cell ◽  
Strain Jump ◽  
Electron Microscopy Analysis ◽  
Microscopy Analysis

This paper presents the results of the combined experimental investigation and digital image correlation (DIC) analysis of the fatigue failure of open cell aluminum foams. Compression–compression cyclic loads were applied to foam specimens under the as-fabricated condition. Following characterization of the S-N curve behavior, the macroscale deformation of the tested foam under fatigue was recorded using an in-situ digital camera. The deformation sequence was then analyzed using DIC technique. It was found that foams failed with an abrupt strain jump when shear bands were formed, and serious deformation up to more than 30% was developed in the center of the shear band. The ex-situ scanning electron microscopy analysis indicated that the abrupt strain jump was due to the microscale damage accumulation in struts where surface cracks were formed and propagated.

Structure and Deformation of Gradient Metal Foams Produced by Machining

2019 ◽  
Author(s):  
H. Qiao ◽  
T. G. Murthy ◽  
C. Saldana
Keyword(s):  
Aluminum Foam ◽  
Mechanical Performance ◽  
Metal Foams ◽  
Aluminum Foams ◽  
Open Cell ◽  
Computed Tomographic ◽  
Surface Gradient ◽  
Structure Changes

Abstract The effects of surface structure on mechanical performance for open-cell aluminum foam specimens was investigated in the present study. A surface gradient for pore structure and diameter was introduced into open cell aluminum foams by machining-based processing. The structure changes in the strut and pore network were evaluated by computed tomography characterization. The role of structure gradients in affecting mechanical performance was determined using digital volume correlation and in situ compression within the computed tomographic scanner. These preliminary results show that the strength of these materials may be enhanced through surface structural gradients.

Structure and Deformation of Gradient Metal Foams Produced by Machining

2019 ◽  
Vol 141 (7) ◽  
Author(s):  
Haipeng Qiao ◽  
Tejas G. Murthy ◽  
Christopher Saldana
Keyword(s):  
Aluminum Foam ◽  
Mechanical Performance ◽  
Metal Foams ◽  
Aluminum Foams ◽  
Open Cell ◽  
Computed Tomographic ◽  
Surface Gradient ◽  
Structure Changes

The effects of surface structure on mechanical performance for open-cell aluminum foam specimens were investigated in the present study. A surface gradient for pore structure and diameter was introduced into open-cell aluminum foams by machining-based processing. The structure changes in the strut and pore network were evaluated by computed tomography characterization. The role of structure gradients in affecting mechanical performance was determined using digital volume correlation and in situ compression within the computed tomographic scanner. These preliminary results show that the strength of these materials may be enhanced through surface structural gradients.

scholarly journals Investigation of plasticity/fatigue mechanisms at interfaces in Ni using ex-situ and in-situ SEM/TEM micro/nano-mechanical testing

2016 ◽  
pp. 205-206
Author(s):  
Vahid Samaeeaghmiyoni ◽  
Jonas Groten ◽  
Hosni Idrissi ◽  
Ruth Schwaiger ◽  
Dominique Schryvers
Keyword(s):  
Mechanical Testing ◽  
Ex Situ

An in situ and ex situ TEM study of the formation of thin cobalt silicide films by molecular beam epitaxy on the silicon (100) surface

1988 ◽  
Vol 46 ◽  
pp. 884-885
Author(s):  
D. Loretto ◽  
J. M. Gibson ◽  
S. M. Yalisove ◽  
R. T. Tung
Keyword(s):  
Molecular Beam Epitaxy ◽  
Molecular Beam ◽  
Defect Density ◽  
High Vacuum ◽  
Ultra High Vacuum ◽  
Ex Situ ◽  
Metal Base ◽  
In Situ Experiments ◽  
Potential Applications

The cobalt disilicide/silicon system has potential applications as a metal-base and as a permeable-base transistor. Although thin, low defect density, films of CoSi2 on Si(111) have been successfully grown, there are reasons to believe that Si(100)/CoSi2 may be better suited to the transmission of electrons at the silicon/silicide interface than Si(111)/CoSi2. A TEM study of the formation of CoSi2 on Si(100) is therefore being conducted. We have previously reported TEM observations on Si(111)/CoSi2 grown both in situ, in an ultra high vacuum (UHV) TEM and ex situ, in a conventional Molecular Beam Epitaxy system.The procedures used for the MBE growth have been described elsewhere. In situ experiments were performed in a JEOL 200CX electron microscope, extensively modified to give a vacuum of better than 10-9 T in the specimen region and the capacity to do in situ sample heating and deposition. Cobalt was deposited onto clean Si(100) samples by thermal evaporation from cobalt-coated Ta filaments.

The use of transmission and analytical electron microscopy in studying reactions and phase transformations in thin film

1993 ◽  
Vol 51 ◽  
pp. 842-843
Author(s):  
K. Barmak
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Phase Transformations ◽  
Analytical Electron Microscopy ◽  
Ex Situ ◽  
Multilayer Thin Films ◽  
Absolute Concentration ◽  
Analytical Electron ◽  
Deposition Step

Generally, processing of thin films involves several annealing steps in addition to the deposition step. During the annealing steps, diffusion, transformations and reactions take place. In this paper, examples of the use of TEM and AEM for ex situ and in situ studies of reactions and phase transformations in thin films will be presented.The ex situ studies were carried out on Nb/Al multilayer thin films annealed to different stages of reaction. Figure 1 shows a multilayer with dNb = 383 and dAl = 117 nm annealed at 750°C for 4 hours. As can be seen in the micrograph, there are four phases, Nb/Nb3-xAl/Nb2-xAl/NbAl3, present in the film at this stage of the reaction. The composition of each of the four regions marked 1-4 was obtained by EDX analysis. The absolute concentration in each region could not be determined due to the lack of thickness and geometry parameters that were required to make the necessary absorption and fluorescence corrections.

Transmission Electron Microscopy of Epitaxial silicides grown by ultra high vacuum deposition

1989 ◽  
Vol 47 ◽  
pp. 462-463
Author(s):  
D. Loretto ◽  
J. M. Gibson ◽  
S. M. Yalisove
Keyword(s):  
Electron Microscopy ◽  
Transmission Electron Microscopy ◽  
Electron Diffraction ◽  
High Vacuum ◽  
High Energy ◽  
Energy Electron ◽  
Ultra High Vacuum ◽  
Ex Situ ◽  
Transmission Electron

The silicides CoSi2 and NiSi2 are both metallic with the fee flourite structure and lattice constants which are close to silicon (1.2% and 0.6% smaller at room temperature respectively) Consequently epitaxial cobalt and nickel disilicide can be grown on silicon. If these layers are formed by ultra high vacuum (UHV) deposition (also known as molecular beam epitaxy or MBE) their thickness can be controlled to within a few monolayers. Such ultrathin metal/silicon systems have many potential applications: for example electronic devices based on ballistic transport. They also provide a model system to study the properties of heterointerfaces. In this work we will discuss results obtained using in situ and ex situ transmission electron microscopy (TEM).In situ TEM is suited to the study of MBE growth for several reasons. It offers high spatial resolution and the ability to penetrate many monolayers of material. This is in contrast to the techniques which are usually employed for in situ measurements in MBE, for example low energy electron diffraction (LEED) and reflection high energy electron diffraction (RHEED), which are both sensitive to only a few monolayers at the surface.

3D NUMERICAL INVESTIGATION OF FLUID FLOW THROUGH OPEN-CELL METAL FOAMS USING MICRO-TOMOGRAPHY IMAGES

2014 ◽  
Vol 17 (11) ◽  
pp. 1019-1029 ◽  
Author(s):  
Mohammad Zafari ◽  
Masoud Panjepour ◽  
Mohsen Davazdah Emami ◽  
Mahmood Meratian
Keyword(s):  
Fluid Flow ◽  
Numerical Investigation ◽  
Metal Foams ◽  
Open Cell ◽  
Flow Through ◽  
Micro Tomography

Atomic Layer Deposition of LiF and Lithium Ion Conducting (AlF3)(LiF)x Alloys Using Trimethylaluminum, Lithium Hexamethyldisilazide and Hydrogen Fluoride

2017 ◽  
Author(s):  
Younghee Lee ◽  
Daniela M. Piper ◽  
Andrew S. Cavanagh ◽  
Matthias J. Young ◽  
Se-Hee Lee ◽  
...  
Keyword(s):  
Lithium Ion ◽  
Atomic Layer ◽  
Mass Gain ◽  
Alloy Film ◽  
Ex Situ ◽  
X Ray ◽  
Layer Deposition ◽  
Ion Conducting ◽  
Good Agreement

<div>Atomic layer deposition (ALD) of LiF and lithium ion conducting (AlF<sub>3</sub>)(LiF)<sub>x</sub> alloys was developed using trimethylaluminum, lithium hexamethyldisilazide (LiHMDS) and hydrogen fluoride derived from HF-pyridine solution. ALD of LiF was studied using in situ quartz crystal microbalance (QCM) and in situ quadrupole mass spectrometer (QMS) at reaction temperatures between 125°C and 250°C. A mass gain per cycle of 12 ng/(cm<sup>2</sup> cycle) was obtained from QCM measurements at 150°C and decreased at higher temperatures. QMS detected FSi(CH<sub>3</sub>)<sub>3</sub> as a reaction byproduct instead of HMDS at 150°C. LiF ALD showed self-limiting behavior. Ex situ measurements using X-ray reflectivity (XRR) and spectroscopic ellipsometry (SE) showed a growth rate of 0.5-0.6 Å/cycle, in good agreement with the in situ QCM measurements.</div><div>ALD of lithium ion conducting (AlF3)(LiF)x alloys was also demonstrated using in situ QCM and in situ QMS at reaction temperatures at 150°C A mass gain per sequence of 22 ng/(cm<sup>2</sup> cycle) was obtained from QCM measurements at 150°C. Ex situ measurements using XRR and SE showed a linear growth rate of 0.9 Å/sequence, in good agreement with the in situ QCM measurements. Stoichiometry between AlF<sub>3</sub> and LiF by QCM experiment was calculated to 1:2.8. XPS showed LiF film consist of lithium and fluorine. XPS also showed (AlF<sub>3</sub>)(LiF)x alloy consists of aluminum, lithium and fluorine. Carbon, oxygen, and nitrogen impurities were both below the detection limit of XPS. Grazing incidence X-ray diffraction (GIXRD) observed that LiF and (AlF<sub>3</sub>)(LiF)<sub>x</sub> alloy film have crystalline structures. Inductively coupled plasma mass spectrometry (ICP-MS) and ionic chromatography revealed atomic ratio of Li:F=1:1.1 and Al:Li:F=1:2.7: 5.4 for (AlF<sub>3</sub>)(LiF)<sub>x</sub> alloy film. These atomic ratios were consistent with the calculation from QCM experiments. Finally, lithium ion conductivity (AlF<sub>3</sub>)(LiF)<sub>x</sub> alloy film was measured as σ = 7.5 × 10<sup>-6</sup> S/cm.</div>

A New Method of Wafer Level Plan View TEM Sample Preparation by DualBeam

2008 ◽  
Author(s):  
Hyoung H. Kang ◽  
Michael A. Gribelyuk ◽  
Oliver D. Patterson ◽  
Steven B. Herschbein ◽  
Corey Senowitz
Keyword(s):  
Sample Preparation ◽  
Ex Situ ◽  
Wafer Level ◽  
Cross Sectional ◽  
Plan View ◽  
Manufacturing Line ◽  
Transmission Electron ◽  
Thin Lamella ◽  
Preparation Techniques

Abstract Cross-sectional style transmission electron microscopy (TEM) sample preparation techniques by DualBeam (SEM/FIB) systems are widely used in both laboratory and manufacturing lines with either in-situ or ex-situ lift out methods. By contrast, however, the plan view TEM sample has only been prepared in the laboratory environment, and only after breaking the wafer. This paper introduces a novel methodology for in-line, plan view TEM sample preparation at the 300mm wafer level that does not require breaking the wafer. It also presents the benefit of the technique on electrically short defects. The methodology of thin lamella TEM sample preparation for plan view work in two different tool configurations is also presented. The detailed procedure of thin lamella sample preparation is also described. In-line, full wafer plan view (S)TEM provides a quick turn around solution for defect analysis in the manufacturing line.

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