Effect of reactor pressure on optical and electrical properties of InN films grown by high-pressure chemical vapor deposition
2015 ◽
Vol 12
(4-5)
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pp. 423-429
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2012 ◽
Vol 30
(3)
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pp. 031511
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2005 ◽
Vol 8
(1-3)
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pp. 125-129
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2005 ◽
Vol 8
(1-3)
◽
pp. 121-124
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Keyword(s):