BiCMOS Process Technology

Author(s):  
R. H. Eklund ◽  
R. A. Haken ◽  
R. H. Havemann ◽  
L. N. Hutter
Author(s):  
R. A. Haken ◽  
R. H. Havemann ◽  
R. H. Eklund ◽  
L. N. Hutter

1995 ◽  
Author(s):  
R. Michael Guidash ◽  
P. P. K. Lee ◽  
J. M. Andrus ◽  
Antonio S. Ciccarelli ◽  
H. J. Erhardt ◽  
...  

Electronics ◽  
2019 ◽  
Vol 8 (10) ◽  
pp. 1149 ◽  
Author(s):  
Lei Luo ◽  
Zhiqun Li ◽  
Yan Yao ◽  
Guoxiao Cheng

A 6-bit Ku band digital step attenuator with low phase variation is presented in this paper. The attenuator is designed with 0.13-μm SiGe BiCMOS process technology using triple well isolation N-Metal-Oxide-Semiconductor (TWNMOS) and through-silicon-via (TSV). TWNMOS is mainly used to improve the performance of switches and reduce the insertion loss (IL). TSV is utilized to provide approximately ideal global current ground plane with low impedance for the attenuator. In addition, substrate floating technique and new capacitance compensation technique are adopted in the attenuator to improve the linearity and decrease the phase variation. The measured results show that the attenuator IL is 6.99–9.33 dB; the maximum relative attenuation is 31.87–30.31 dB with 0.5-dB step (64 states), the root mean square (RMS) for the amplitude error is 0.58–0.36 dB and the phase error RMS is 2.06–3.46° in the 12–17 GHz frequency range. The total chip area is 1 × 0.9 mm2.


Author(s):  
R. T. Chen ◽  
R.A. Norwood

Sol-gel processing has been used to control the structure of a material on a nanometer scale in preparing advanced ceramics and glasses. Film coating using the sol-gel process was also found to be a viable process technology in applications such as optical, porous, antireflection and hard coatings. In this study, organically modified silicate (Ormosil) coatings are applied to PET films for various industrial applications. Sol-gel materials are known to exhibit nanometer scale structures which havepreviously been characterized by small-angle X-ray scattering (SAXS), neutron scattering and light scattering. Imaging of the ultrafine sol-gel structures has also been performed using an ultrahigh resolution replica/TEM technique. The objective of this study was to evaluate the ultrafine structures inthe sol gel coatings using a direct imaging technique: atomic force microscopy (AFM). In addition, correlation of microstructures with processing parameters, coating density and other physical properties will be discussed.The materials evaluated are organically modified silicate coatings on PET film substrates. Refractive index measurement by the prism coupling method was used to assess density of the sol-gel coating.AFM imaging was performed on a Nanoscope III AFM (by Digital Instruments) using constant force mode. Solgel coating samples coated with a thin layer of Ft (by ion beam sputtering) were also examined by STM in order to confirm the structures observed in the contact type AFM. In addition, to compare the previous results, sol-gel powder samples were also prepared by ultrasonication followed by Pt/Au shadowing and examined using a JEOL 100CX TEM.


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