A Multi-phase LC-Ring-Based Voltage Controlled Oscillator

Abstract. A Gb/s clock and data recovery (CDR) circuit using 1/4th-rate digital quadricorrelator frequency detector and skew-calibrated multi-phase voltage-controlled oscillator is presented. With 1/4th-rate clock architecture, the coil-free oscillator can have lower operation frequency providing sufficient low-jitter operation. Moreover, it is an inherent 1-to-4 DEMUX. The skew calibration scheme is applied to reduce phase offset in multi-phase clock generator. The CDR with frequency detector can have small loop bandwidth, wide pull-in range and can operate without the need for a local reference clock. This 1/4th-rate CDR is implemented in standard 0.18 μm CMOS technology. It has an active area of 0.7 mm2 and consumes 100 mW at 1.8 V supply. The CDR has low jitter operation in a wide frequency range from 1–2.25 Gb/s. Measurement of Bit-Error Rate is less than 10−12 for 2.25 Gb/s incoming data 27−1 PRBS, jitter peak-to-peak of 0.7 unit interval (UI) modulation at 10 MHz.

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A time-to-digital converter using a multi-phase voltage-controlled oscillator

2010 IEEE International Conference of Electron Devices and Solid-State Circuits (EDSSC) ◽

10.1109/edssc.2010.5713764 ◽

2010 ◽

Author(s):

I-Fu Tang ◽

Shao-Ku Kao

Keyword(s):

Voltage Controlled Oscillator ◽

Digital Converter ◽

Phase Voltage ◽

Time To Digital Converter ◽

Multi Phase

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Some Applications of the U. S. Steel MVEM

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s0424820100070461 ◽

1973 ◽

Vol 31 ◽

pp. 4-5

Author(s):

J. S. Lally ◽

L. E. Thomas ◽

R. M. Fisher

Keyword(s):

Electron Diffraction ◽

Debye Temperature ◽

Metals And Alloys ◽

Critical Voltage ◽

Dynamical Diffraction ◽

Phase Structures ◽

Structure Factors ◽

Local Bonding ◽

Diffraction Phenomenon ◽

Multi Phase

A variety of materials containing many different microstructures have been examined with the USS MVEM. Three topics have been selected to illustrate some of the more recent studies of diffraction phenomena and defect, grain and multi-phase structures of metals and minerals.(1) Critical Voltage Effects in Metals and Alloys - This many-beam dynamical diffraction phenomenon, in which some Bragg resonances vanish at certain accelerating voltages, Vc, depends sensitively on the spacing of diffracting planes, Debye temperature θD and structure factors. Vc values can be measured to ± 0.5% in the HVEM ana used to obtain improved extinction distances and θD values appropriate to electron diffraction, as well as to probe local bonding effects and composition variations in alloys.

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Digital imaging and quantitative image analysis of polymer blends

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s0424820100163319 ◽

1996 ◽

Vol 54 ◽

pp. 170-171

Author(s):

Xiao Zhang

Keyword(s):

Digital Imaging ◽

Imaging Techniques ◽

Imaging Systems ◽

Polymer Science ◽

Key Factors ◽

Multiple Imaging ◽

Quantitative Image ◽

Digital Imaging Systems ◽

Multi Phase ◽

Network Technologies

Polymer microscopy involves multiple imaging techniques. Speed, simplicity, and productivity are key factors in running an industrial polymer microscopy lab. In polymer science, the morphology of a multi-phase blend is often the link between process and properties. The extent to which the researcher can quantify the morphology determines the strength of the link. To aid the polymer microscopist in these tasks, digital imaging systems are becoming more prevalent. Advances in computers, digital imaging hardware and software, and network technologies have made it possible to implement digital imaging systems in industrial microscopy labs.

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