Plasma enhanced chemical vapor deposition of SiO2 films at low temperatures using SiCl4 and O2
1990 ◽
Vol 19
(12)
◽
pp. 1411-1415
◽
Keyword(s):
1991 ◽
Vol 34
(2)
◽
pp. 123-129
◽
Keyword(s):
Keyword(s):
2007 ◽
Vol 46
(4A)
◽
pp. 1415-1426
◽
2007 ◽
Vol 51
(5)
◽
pp. 1743-1747
◽
Keyword(s):
Silicon epitaxy using tetrasilane at low temperatures in ultra-high vacuum chemical vapor deposition
2016 ◽
Vol 444
◽
pp. 21-27
◽
Keyword(s):