Atmospheric pressure plasma chemical vapor deposition system for high-rate deposition of functional materials

2000 ◽  
Vol 71 (8) ◽  
pp. 3173-3177 ◽  
Author(s):  
Y. Mori ◽  
K. Yoshii ◽  
H. Kakiuchi ◽  
K. Yasutake
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Atmospheric Pressure ◽  
Atmospheric Pressure Plasma ◽  
Chemical Vapor ◽  
Functional Materials ◽  
High Rate ◽  
Plasma Chemical ◽  
Plasma Chemical Vapor Deposition ◽  
Pressure Plasma

scholarly journals Antibacterial Silicon Oxide Thin Films Doped with Zinc and Copper Grown by Atmospheric Pressure Plasma Chemical Vapor Deposition

Nanomaterials ◽  
2019 ◽  
Vol 9 (2) ◽  
pp. 255 ◽  
Author(s):  
Elisabeth Jäger ◽  
Jürgen Schmidt ◽  
Andreas Pfuch ◽  
Sebastian Spange ◽  
Oliver Beier ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Atmospheric Pressure ◽  
Film Surface ◽  
Atmospheric Pressure Plasma ◽  
Chemical Vapor ◽  
Plasma Chemical ◽  
Plasma Chemical Vapor Deposition ◽  
Pressure Plasma ◽  
Mouse Cells

Zn-doped and Cu-doped SiOx films were synthesized by atmospheric pressure plasma chemical vapor deposition to study their antibacterial efficiency against Gram-negative Escherichia coli and their cytotoxic effect on the growth of mouse cells. Zn-rich and Cu-rich particles with diameters up to several microns were found to be homogeneously distributed within the SiOx films. For both doping elements, bacteria are killed within the first three hours after exposure to the film surface. In contrast, mouse cells grow well on the surfaces of both film types, with a slight inhibition present only after the first day of exposure. The obtained results indicate that the films show a high potential for use as effective antibacterial surfaces for medical applications.

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